Paper Abstract and Keywords |
Presentation |
2005-11-11 14:45
Changes of surface structures during reactions of monomethylgermane on Si(001)
-- Toward to fabrication of Ge embedded in SiC structure -- Masayuki Harashima, Tetsushi Kanemaru, Ariyuki Kato, Tomoaki Ogiwara, Kanji Yasui, Tadashi Akahane, Masasuke Takata (Nagaoka Univ. of Technol.) Link to ES Tech. Rep. Archives: CPM2005-155 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Initial stage of surface reactions between monomethylgermane (MMGe:
GeH$_3$CH$_3$) and Si(001) surfaces has been analyzed using reflective
high-energy electron diffraction (RHEED), scanning tunneling microscopy
(STM) and X-ray photoelectron spectroscopy (XPS). The reactions were
similar to those using monomethylsilane (MMS: SiH$_3$CH$_3$), that is,
c(4$\times$4) structure which may be caused by incorporation of carbon
atoms into the Si substrate appeared after a supply of molecules,
followed by SiC islands formation as the c(4$\times$4) disappeared.
At the same time, Ge related spots were observed near SiC twin spots on
the RHEED pattern. XPS revealed that Ge existed in the form of Ge or
SiGe on the surface layer without forming carbon clusters. Weak
photoluminescence (PL) peaks around 0.85eV and 0.95eV, which are
considered to originate from Ge nanodots, were observed. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Surface reaction / Si(001) / c(4x4) / SiC / Ge / nano-structure / / |
Reference Info. |
IEICE Tech. Rep., vol. 105, no. 393, CPM2005-155, pp. 19-24, Nov. 2005. |
Paper # |
CPM2005-155 |
Date of Issue |
2005-11-04 (CPM) |
ISSN |
Print edition: ISSN 0913-5685 |
Copyright and reproduction |
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Link to ES Tech. Rep. Archives: CPM2005-155 |
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