Paper Abstract and Keywords |
Presentation |
2005-12-22 14:25
Optimization of poly-Si TFT for controlling field emitter arrays Chiaki Yasumuro, Yuuichi Sakamura, Masayoshi Nagao, Hisao Tanoue, Seigo Kanemaru, Junji Itoh (AIST) Link to ES Tech. Rep. Archives: ED2005-186 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We have already proposed thin-film transistor (TFT) controlled field emitter arrays (FEAs) to improve uniformity of field emission display.
The important features of the TFT for emission control are high withstand voltage, kink free, and low off leakage current.
In this article, the structure of poly-Si TFT was optimized in the view point of controlling field emission current.
The multi-gate structure, lightly-doped drain (LDD) structure, and their combination were tested.
We found that the channel length should be more than 50 um for kink free characteristics and that the combination of multi-gate and LDD structure is effective for high withstand voltage and low off current.
By using this optimized structure, the TFT-controlled FEA was fabricated and successfully operated. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Vacuum nano-electronics / field emission display / field emitter array / poly-Si TFT / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 105, no. 498, ED2005-186, pp. 21-26, Dec. 2005. |
Paper # |
ED2005-186 |
Date of Issue |
2005-12-15 (ED) |
ISSN |
Print edition: ISSN 0913-5685 |
Copyright and reproduction |
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Link to ES Tech. Rep. Archives: ED2005-186 |