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| Presentation | 2007-12-14 14:40 silicon photonic crystal device fabricated using high-aspect ratio dry etching technique Kazuhiko Hosomi (Hitachi CRL), Hiroji Yamada (OITDA), Shoji Akamatsu (NCRC., Univ. of Tokyo), Misuzu Sagawa (Hitachi CRL), Toshio Katsuyama, Yasuhiko Arakawa (NCRC., Univ. of Tokyo) Link to ES Tech. Rep. Archives:  OPE2007-139 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | To realize photonic crystal devices with no polarization dependence, we have been developing 1D- and 3D-silicon photonic crystal devices fabricated using high-aspect ratio dry etching technique. We fabricated 1D perfect photonic crystal and measured optical transmission properties. We also demonstrated fundamental function of chemical sensor using micro cavity made of 1D photonic crystal. In addition, we developed 45 degree angled etching technique, which enables fabrication of 3D photonic crystals with conventional semiconductor processes. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Photonic crystal / High-Aspect Ratio Dry Etching / Micro Cavity / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 107, no. 389, OPE2007-139, pp. 21-26, Dec. 2007. | |
| Paper # | OPE2007-139 | |
| Date of Issue | 2007-12-07 (OPE) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | Link to ES Tech. Rep. Archives: OPE2007-139 |
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| Conference Information | |
| Committee | OPE |
| Conference Date | 2007-12-14 - 2007-12-14 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kikai-Shinko-Kaikan Bldg. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | OPE |
| Conference Code | 2007-12-OPE |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | silicon photonic crystal device fabricated using high-aspect ratio dry etching technique |
| Sub Title (in English) | |
| Keyword(1) | Photonic crystal |
| Keyword(2) | High-Aspect Ratio Dry Etching |
| Keyword(3) | Micro Cavity |
| Keyword(4) | |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Kazuhiko Hosomi |
| 1st Author's Affiliation | Hitachi Ltd., Central Research Laboratory (Hitachi CRL) |
| 2nd Author's Name | Hiroji Yamada |
| 2nd Author's Affiliation | Optoelectronic industry and technology development association (OITDA) |
| 3rd Author's Name | Shoji Akamatsu |
| 3rd Author's Affiliation | Nanoelectronics Collaborative Research Center, University of Tokyo (NCRC., Univ. of Tokyo) |
| 4th Author's Name | Misuzu Sagawa |
| 4th Author's Affiliation | Hitachi Ltd., Central Research Laboratory (Hitachi CRL) |
| 5th Author's Name | Toshio Katsuyama |
| 5th Author's Affiliation | Nanoelectronics Collaborative Research Center, University of Tokyo (NCRC., Univ. of Tokyo) |
| 6th Author's Name | Yasuhiko Arakawa |
| 6th Author's Affiliation | Nanoelectronics Collaborative Research Center, University of Tokyo (NCRC., Univ. of Tokyo) |
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| Speaker | Author-1 |
| Date Time | 2007-12-14 14:40:00 |
| Presentation Time | 25 minutes |
| Registration for | OPE |
| Paper # | OPE2007-139 |
| Volume (vol) | vol.107 |
| Number (no) | no.389 |
| Page | pp.21-26 |
| #Pages | 6 |
| Date of Issue | 2007-12-07 (OPE) |
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