Paper Abstract and Keywords |
Presentation |
2008-05-15 15:15
Preparation of TiO2 films by RF magnetron sputtering method Tatsuya Endo, Yuichi Mizuchi, Masaaki Isai (Shizuoka Univ.) ED2008-6 CPM2008-14 SDM2008-26 Link to ES Tech. Rep. Archives: ED2008-6 CPM2008-14 SDM2008-26 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
TiO2 films have been focused as a photocatalyst. They have remarkable properties, for example, to resolute organic pollutant and to give hydrophobicity by irradiating near-ultra-violet-light. In the conventional preparation processes, a heating process should be used to improve their crystallinity and films are easily peeled from substrates. This research is aimed to prepare TiO2 films on slide-glass substrates at room temperature by using magnetron sputtering method. TiO2 powder was used as a target material. Ar gas was used as a sputtering atmosphere. Variations of crystal properties and morphology were investigated as a function of substrate temperature. It was found that Anatase-type films could be prepared at room temperature. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
TiO2 thin film / RF magnetron sputtering / photocatalyst / low temperature preparation / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 108, no. 35, CPM2008-14, pp. 23-28, May 2008. |
Paper # |
CPM2008-14 |
Date of Issue |
2008-05-08 (ED, CPM, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
ED2008-6 CPM2008-14 SDM2008-26 Link to ES Tech. Rep. Archives: ED2008-6 CPM2008-14 SDM2008-26 |
Conference Information |
Committee |
CPM ED SDM |
Conference Date |
2008-05-15 - 2008-05-16 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Nagoya Institute of Technology |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Crystal growth, evaluation and device (Compound, Si, SiGe, Electronic and light emitting materials) |
Paper Information |
Registration To |
CPM |
Conference Code |
2008-05-CPM-ED-SDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Preparation of TiO2 films by RF magnetron sputtering method |
Sub Title (in English) |
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Keyword(1) |
TiO2 thin film |
Keyword(2) |
RF magnetron sputtering |
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photocatalyst |
Keyword(4) |
low temperature preparation |
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1st Author's Name |
Tatsuya Endo |
1st Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
2nd Author's Name |
Yuichi Mizuchi |
2nd Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
3rd Author's Name |
Masaaki Isai |
3rd Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
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Speaker |
Author-1 |
Date Time |
2008-05-15 15:15:00 |
Presentation Time |
25 minutes |
Registration for |
CPM |
Paper # |
ED2008-6, CPM2008-14, SDM2008-26 |
Volume (vol) |
vol.108 |
Number (no) |
no.34(ED), no.35(CPM), no.36(SDM) |
Page |
pp.23-28 |
#Pages |
6 |
Date of Issue |
2008-05-08 (ED, CPM, SDM) |
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