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Paper Abstract and Keywords
Presentation 2008-05-15 15:15
Preparation of TiO2 films by RF magnetron sputtering method
Tatsuya Endo, Yuichi Mizuchi, Masaaki Isai (Shizuoka Univ.) ED2008-6 CPM2008-14 SDM2008-26 Link to ES Tech. Rep. Archives: ED2008-6 CPM2008-14 SDM2008-26
Abstract (in Japanese) (See Japanese page) 
(in English) TiO2 films have been focused as a photocatalyst. They have remarkable properties, for example, to resolute organic pollutant and to give hydrophobicity by irradiating near-ultra-violet-light. In the conventional preparation processes, a heating process should be used to improve their crystallinity and films are easily peeled from substrates. This research is aimed to prepare TiO2 films on slide-glass substrates at room temperature by using magnetron sputtering method. TiO2 powder was used as a target material. Ar gas was used as a sputtering atmosphere. Variations of crystal properties and morphology were investigated as a function of substrate temperature. It was found that Anatase-type films could be prepared at room temperature.
Keyword (in Japanese) (See Japanese page) 
(in English) TiO2 thin film / RF magnetron sputtering / photocatalyst / low temperature preparation / / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 35, CPM2008-14, pp. 23-28, May 2008.
Paper # CPM2008-14 
Date of Issue 2008-05-08 (ED, CPM, SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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Download PDF ED2008-6 CPM2008-14 SDM2008-26 Link to ES Tech. Rep. Archives: ED2008-6 CPM2008-14 SDM2008-26

Conference Information
Committee CPM ED SDM  
Conference Date 2008-05-15 - 2008-05-16 
Place (in Japanese) (See Japanese page) 
Place (in English) Nagoya Institute of Technology 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Crystal growth, evaluation and device (Compound, Si, SiGe, Electronic and light emitting materials) 
Paper Information
Registration To CPM 
Conference Code 2008-05-CPM-ED-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Preparation of TiO2 films by RF magnetron sputtering method 
Sub Title (in English)  
Keyword(1) TiO2 thin film  
Keyword(2) RF magnetron sputtering  
Keyword(3) photocatalyst  
Keyword(4) low temperature preparation  
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1st Author's Name Tatsuya Endo  
1st Author's Affiliation Shizuoka University (Shizuoka Univ.)
2nd Author's Name Yuichi Mizuchi  
2nd Author's Affiliation Shizuoka University (Shizuoka Univ.)
3rd Author's Name Masaaki Isai  
3rd Author's Affiliation Shizuoka University (Shizuoka Univ.)
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Speaker Author-1 
Date Time 2008-05-15 15:15:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # ED2008-6, CPM2008-14, SDM2008-26 
Volume (vol) vol.108 
Number (no) no.34(ED), no.35(CPM), no.36(SDM) 
Page pp.23-28 
#Pages
Date of Issue 2008-05-08 (ED, CPM, SDM) 


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