Paper Abstract and Keywords |
Presentation |
2008-05-15 16:15
Fabrication and evaluation of InGaPN/GaPN DH LED light emitting diode grown by organometallic vapor phase epitaxy. Fumiya Matsuno, Susumu Hatakenaka, Yoshiyuki Nakanishi, Hiroshi Okada, Yuzo Furukawa, Akihiro Wakahara (Toyohashi Univ. Tech.) |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
III-V-N compound semiconductors are one of the promising materials to be applied in OEIC. GaP0.98N0.02 can be lattice-matched to Si and has be expected as one of the materials for active layer in the OEIC. We investigated electrical properties of GaPN doped with S or C which were grown by OMVPE . For s-doped GaPN, n-type conduction with the carrier concentration of 1017~1018cm-3 was obtained by changing H2S/TBP ratio. Similarly, p-type GaPN with the hole concentration of 1016~1019cm-3 was by controlling C concentration via TBP/TEGa ratio.
A GaPN pn-junction LED and an InGaPN/GaPN DH LED were fabricated on a Si substrate using OMVPE and MEE. The GaPN pn-junction LED’s and the InGaPN/GaPN DH LED’s showed diode characteristic. The GaPN pn-junction LED’s were operated 51A/cm2(100mA) at room temperature, the emission central wavelength was 650nm. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
OEIC / OMVPE / InGaPN / LED / / / / |
Reference Info. |
IEICE Tech. Rep. |
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