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Paper Abstract and Keywords
Presentation 2009-01-15 13:50
Reduction of the Base Transit Time in Ultra-thin Graded-Base InP/GaInAs Heterojunction Bipolar Transistor
Takafumi Uesawa, Masayuki Yamada, Yasuyuki Miyamoto, Kazuhito Furuya (Tokyo Inst. of Tech.) ED2008-212 MW2008-177 Link to ES Tech. Rep. Archives: ED2008-212 MW2008-177
Abstract (in Japanese) (See Japanese page) 
(in English) Abstract We report a Monte Carlo analysis of base transit time in ultra-thin and heavily-doped InP/InGaAs HBT’s. In ultra-thin base layer less than 20nm, the influence of the plasmon scattering in electron transport is significant. Therefore, it is effective to use graded base in order to sweep out quasi-thermalized electrons. As for graded base, we carried out Monte Carlo Simulation under the condition that the total of graded energy and conduction band discontinuity between base and emitter is constant. Although the best graded energy to minimize base transit time is from 5kT to 7kT, small grading such as 1-2kT is also effective. When 2kT grading is introduced in 20 nm base, 40% reduction of base transit time is calculated.
Keyword (in Japanese) (See Japanese page) 
(in English) HeteroJunction Bipolar Transistor(HBT) / Base Transit Time / Graded Base / MonteCarlo / Hole-Plasmon Scattering / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 376, ED2008-212, pp. 83-88, Jan. 2009.
Paper # ED2008-212 
Date of Issue 2009-01-07 (ED, MW) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2008-212 MW2008-177 Link to ES Tech. Rep. Archives: ED2008-212 MW2008-177

Conference Information
Committee MW ED  
Conference Date 2009-01-14 - 2009-01-16 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Compound Semiconductor ICs, High-speed and high-frequency devices 
Paper Information
Registration To ED 
Conference Code 2009-01-MW-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Reduction of the Base Transit Time in Ultra-thin Graded-Base InP/GaInAs Heterojunction Bipolar Transistor 
Sub Title (in English)  
Keyword(1) HeteroJunction Bipolar Transistor(HBT)  
Keyword(2) Base Transit Time  
Keyword(3) Graded Base  
Keyword(4) MonteCarlo  
Keyword(5) Hole-Plasmon Scattering  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Takafumi Uesawa  
1st Author's Affiliation Tokyo Institute of Technology (Tokyo Inst. of Tech.)
2nd Author's Name Masayuki Yamada  
2nd Author's Affiliation Tokyo Institute of Technology (Tokyo Inst. of Tech.)
3rd Author's Name Yasuyuki Miyamoto  
3rd Author's Affiliation Tokyo Institute of Technology (Tokyo Inst. of Tech.)
4th Author's Name Kazuhito Furuya  
4th Author's Affiliation Tokyo Institute of Technology (Tokyo Inst. of Tech.)
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Speaker Author-1 
Date Time 2009-01-15 13:50:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2008-212, MW2008-177 
Volume (vol) vol.108 
Number (no) no.376(ED), no.377(MW) 
Page pp.83-88 
#Pages
Date of Issue 2009-01-07 (ED, MW) 


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