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Paper Abstract and Keywords
Presentation 2009-01-16 10:55
High-Power GaN-HEMT with High Three-Terminal Breakdown Voltage for W-band Applications
Kozo Makiyama, Toshihiro Ohki, Masahito Kanamura, Kazukiyo Joshin, Kenji Imanishi (Fujitsu Ltd/Fujitsu Lab. Ltd.), Naoki Hara (Fujitsu Lab. Ltd.), Toshihide Kikkawa (Fujitsu Ltd/Fujitsu Lab. Ltd.) ED2008-221 MW2008-186 Link to ES Tech. Rep. Archives: ED2008-221 MW2008-186
Abstract (in Japanese) (See Japanese page) 
(in English) We reported on a technology to improve the three-terminal breakdown voltage of a GaN high electron mobility transistor (GaN-HEMT) for a millimeter-wave amplifier. A GaN-HEMT promises excellent performance for high-power millimeter-wave applications. Up till now, a lot of research has been reported on the improvement of high-power millimeter-wave amplifiers. To fabricate such amplifiers, three-terminal pinched-off-current must be decreased to less than 10-6 A/mm when the gate length becomes less than 0.1 m. In this work, the epitaxial structure has been optimized to reduce the pinched-off current. As a result, we demonstrated a high fmax of over 200GHz with pinched-off current of 10-6 A/mm at Vds of 30 V for a device with a gate length of 100 nm. The power characteristics at W-band were also investigated, we demonstrated Pout of 0.77 W/mm.
Keyword (in Japanese) (See Japanese page) 
(in English) GaN-HEMT / amplifier / millimeter-wave / three-terminal breakdown voltage / pinched-off current / drain leakage current / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 376, ED2008-221, pp. 129-133, Jan. 2009.
Paper # ED2008-221 
Date of Issue 2009-01-07 (ED, MW) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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Download PDF ED2008-221 MW2008-186 Link to ES Tech. Rep. Archives: ED2008-221 MW2008-186

Conference Information
Committee MW ED  
Conference Date 2009-01-14 - 2009-01-16 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Compound Semiconductor ICs, High-speed and high-frequency devices 
Paper Information
Registration To ED 
Conference Code 2009-01-MW-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) High-Power GaN-HEMT with High Three-Terminal Breakdown Voltage for W-band Applications 
Sub Title (in English)  
Keyword(1) GaN-HEMT  
Keyword(2) amplifier  
Keyword(3) millimeter-wave  
Keyword(4) three-terminal breakdown voltage  
Keyword(5) pinched-off current  
Keyword(6) drain leakage current  
Keyword(7)  
Keyword(8)  
1st Author's Name Kozo Makiyama  
1st Author's Affiliation Fujitsu Limited (Fujitsu Ltd/Fujitsu Lab. Ltd.)
2nd Author's Name Toshihiro Ohki  
2nd Author's Affiliation Fujitsu Limited (Fujitsu Ltd/Fujitsu Lab. Ltd.)
3rd Author's Name Masahito Kanamura  
3rd Author's Affiliation Fujitsu Limited (Fujitsu Ltd/Fujitsu Lab. Ltd.)
4th Author's Name Kazukiyo Joshin  
4th Author's Affiliation Fujitsu Limited (Fujitsu Ltd/Fujitsu Lab. Ltd.)
5th Author's Name Kenji Imanishi  
5th Author's Affiliation Fujitsu Limited (Fujitsu Ltd/Fujitsu Lab. Ltd.)
6th Author's Name Naoki Hara  
6th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Lab. Ltd.)
7th Author's Name Toshihide Kikkawa  
7th Author's Affiliation Fujitsu Limited (Fujitsu Ltd/Fujitsu Lab. Ltd.)
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Speaker Author-1 
Date Time 2009-01-16 10:55:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2008-221, MW2008-186 
Volume (vol) vol.108 
Number (no) no.376(ED), no.377(MW) 
Page pp.129-133 
#Pages
Date of Issue 2009-01-07 (ED, MW) 


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