Paper Abstract and Keywords |
Presentation |
2009-01-16 10:55
High-Power GaN-HEMT with High Three-Terminal Breakdown Voltage for W-band Applications Kozo Makiyama, Toshihiro Ohki, Masahito Kanamura, Kazukiyo Joshin, Kenji Imanishi (Fujitsu Ltd/Fujitsu Lab. Ltd.), Naoki Hara (Fujitsu Lab. Ltd.), Toshihide Kikkawa (Fujitsu Ltd/Fujitsu Lab. Ltd.) ED2008-221 MW2008-186 Link to ES Tech. Rep. Archives: ED2008-221 MW2008-186 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We reported on a technology to improve the three-terminal breakdown voltage of a GaN high electron mobility transistor (GaN-HEMT) for a millimeter-wave amplifier. A GaN-HEMT promises excellent performance for high-power millimeter-wave applications. Up till now, a lot of research has been reported on the improvement of high-power millimeter-wave amplifiers. To fabricate such amplifiers, three-terminal pinched-off-current must be decreased to less than 10-6 A/mm when the gate length becomes less than 0.1 m. In this work, the epitaxial structure has been optimized to reduce the pinched-off current. As a result, we demonstrated a high fmax of over 200GHz with pinched-off current of 10-6 A/mm at Vds of 30 V for a device with a gate length of 100 nm. The power characteristics at W-band were also investigated, we demonstrated Pout of 0.77 W/mm. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
GaN-HEMT / amplifier / millimeter-wave / three-terminal breakdown voltage / pinched-off current / drain leakage current / / |
Reference Info. |
IEICE Tech. Rep., vol. 108, no. 376, ED2008-221, pp. 129-133, Jan. 2009. |
Paper # |
ED2008-221 |
Date of Issue |
2009-01-07 (ED, MW) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2008-221 MW2008-186 Link to ES Tech. Rep. Archives: ED2008-221 MW2008-186 |
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