Paper Abstract and Keywords |
Presentation |
2009-01-29 08:30
Fabrication of Blazed Grating by Using Phase-Shifting Mask Hideyuki Awazu (Kyoto Inst. Technol.), Kenji Kintaka (AIST), Kenzo Nishio, Yasuhiro Awatsuji, Shogo Ura (Kyoto Inst. Technol.), Junji Nishii (AIST) PN2008-42 OPE2008-145 LQE2008-142 Link to ES Tech. Rep. Archives: OPE2008-145 LQE2008-142 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
A new simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings. The phase-shifting mask consists of a periodic relief pattern and provides a required phase shift. The phase shifting was designed with 244nm exposure-light wavelength to launch multiple diffraction beams so that the resultant interference pattern formed a 3-$\mu$m-period sawtooth optical-intensity profile. A photoresist was coated on a $SiO_{2}$ substrate. A relief of 65nm height was patterned on the $SiO_{2}$ substrate by electron-beam direct writing lithography. A plane wave was illuminated from the rear side of the phase-shifting mask and a sawtooth-like optical intensity profile was observed after 15$\mu$m propagation. A UV-photoresist layer coated on a substrate was exposed by the sawtooth-like intensity pattern and developed. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Phase-Shifting Mask / Blazed Gratings / Microfabrication Technique / Diffraction Optical Element / Interference Exposure / Near-Field Photolithography / / |
Reference Info. |
IEICE Tech. Rep., vol. 108, no. 419, LQE2008-142, pp. 1-6, Jan. 2009. |
Paper # |
LQE2008-142 |
Date of Issue |
2009-01-22 (PN, OPE, LQE) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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Download PDF |
PN2008-42 OPE2008-145 LQE2008-142 Link to ES Tech. Rep. Archives: OPE2008-145 LQE2008-142 |