Paper Abstract and Keywords |
Presentation |
2009-05-22 09:55
Physical Vapor Deposition of Fluoropolymer Thin Films and Their Characteristics as Antireflective Coating Yasuhiro Hosoda (Tokyo Univ. of Agr & Tech.), Yuji Muraoka, Takashi Fujita, Shinsuke Morii (Komatsulite Mfg.Co.,Ltd.), Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. of Agr & Tech.) OME2009-9 Link to ES Tech. Rep. Archives: OME2009-9 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Electron-assisted physical vapor deposition polymerization was employed to prepare fluoropolymer thin films for antireflective coating. Single-component thin films prepared by depositing 2-(perfluorodecyl)ethyl acrylate (Rf-10) yielded fluoropolymer thin films having refractive index of 1.36. This film deposited on glass substrate to a thickness of 100 nm reduced its reflectivity to less than 1%. With a purpose to increase the glass transition temperature of the film, Rf-10 was coevaporated with either Zinc-acrylate or Dodecafluoro-1,9-decadiene. The coevaporation induced crosslinking of the polymer and was effective to improve thermal stability of the film. However, it also resulted to increase the refractive index. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
anti-reflective coating / reflactive index / fluoropolymer / electron-assisted deposition polymerization / crosslinking / / / |
Reference Info. |
IEICE Tech. Rep., vol. 109, no. 48, OME2009-9, pp. 3-7, May 2009. |
Paper # |
OME2009-9 |
Date of Issue |
2009-05-15 (OME) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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OME2009-9 Link to ES Tech. Rep. Archives: OME2009-9 |
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