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Paper Abstract and Keywords
Presentation 2009-05-22 09:55
Physical Vapor Deposition of Fluoropolymer Thin Films and Their Characteristics as Antireflective Coating
Yasuhiro Hosoda (Tokyo Univ. of Agr & Tech.), Yuji Muraoka, Takashi Fujita, Shinsuke Morii (Komatsulite Mfg.Co.,Ltd.), Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. of Agr & Tech.) OME2009-9 Link to ES Tech. Rep. Archives: OME2009-9
Abstract (in Japanese) (See Japanese page) 
(in English) Electron-assisted physical vapor deposition polymerization was employed to prepare fluoropolymer thin films for antireflective coating. Single-component thin films prepared by depositing 2-(perfluorodecyl)ethyl acrylate (Rf-10) yielded fluoropolymer thin films having refractive index of 1.36. This film deposited on glass substrate to a thickness of 100 nm reduced its reflectivity to less than 1%. With a purpose to increase the glass transition temperature of the film, Rf-10 was coevaporated with either Zinc-acrylate or Dodecafluoro-1,9-decadiene. The coevaporation induced crosslinking of the polymer and was effective to improve thermal stability of the film. However, it also resulted to increase the refractive index.
Keyword (in Japanese) (See Japanese page) 
(in English) anti-reflective coating / reflactive index / fluoropolymer / electron-assisted deposition polymerization / crosslinking / / /  
Reference Info. IEICE Tech. Rep., vol. 109, no. 48, OME2009-9, pp. 3-7, May 2009.
Paper # OME2009-9 
Date of Issue 2009-05-15 (OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF OME2009-9 Link to ES Tech. Rep. Archives: OME2009-9

Conference Information
Committee OME  
Conference Date 2009-05-22 - 2009-05-22 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Organic Materials, Thin Films, Interfaces and Devices/Interface Control and Process Technology for Film-Based Devices 
Paper Information
Registration To OME 
Conference Code 2009-05-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Physical Vapor Deposition of Fluoropolymer Thin Films and Their Characteristics as Antireflective Coating 
Sub Title (in English)  
Keyword(1) anti-reflective coating  
Keyword(2) reflactive index  
Keyword(3) fluoropolymer  
Keyword(4) electron-assisted deposition polymerization  
Keyword(5) crosslinking  
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1st Author's Name Yasuhiro Hosoda  
1st Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr & Tech.)
2nd Author's Name Yuji Muraoka  
2nd Author's Affiliation Komatsulinte Manifacutring Company Limitted (Komatsulite Mfg.Co.,Ltd.)
3rd Author's Name Takashi Fujita  
3rd Author's Affiliation Komatsulinte Manifacutring Company Limitted (Komatsulite Mfg.Co.,Ltd.)
4th Author's Name Shinsuke Morii  
4th Author's Affiliation Komatsulinte Manifacutring Company Limitted (Komatsulite Mfg.Co.,Ltd.)
5th Author's Name Kuniaki Tanaka  
5th Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr & Tech.)
6th Author's Name Hiroaki Usui  
6th Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr & Tech.)
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Speaker Author-6 
Date Time 2009-05-22 09:55:00 
Presentation Time 25 minutes 
Registration for OME 
Paper # OME2009-9 
Volume (vol) vol.109 
Number (no) no.48 
Page pp.3-7 
#Pages
Date of Issue 2009-05-15 (OME) 


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