Paper Abstract and Keywords |
Presentation |
2010-01-29 14:25
Aluminum surface plasmon color filter Naoki Ikeda, Daiju Tsuya, Yoshimasa Sugimoto, Yasuo Koide (National Inst. for Materials Science), Atsushi Miura, Daisuke Inoue, Tsuyoshi Nomura, Hisayoshi Fujikawa, Kazuo Sato (Toyota CRDL) PN2009-59 OPE2009-197 LQE2009-179 Link to ES Tech. Rep. Archives: OPE2009-197 LQE2009-179 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
In order to realize surface plasmon color filter we fabricated precise hole array which lattice constant of 300~400nm using electron beam lithography and reactive ion beam etching in Aluminum thin film with high plasma frequency. Transmission thorough hole array which caused by resonance of surface plasmon is controlled by lattice constant. Hole array show filter characteristics of transmission of 30% and band width of 50nm in full visible light region. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Surface plasmon / Plasma frequency / Electron beam lithography / Reactive ion etching / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 109, no. 402, OPE2009-197, pp. 129-132, Jan. 2010. |
Paper # |
OPE2009-197 |
Date of Issue |
2010-01-21 (PN, OPE, LQE) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
PN2009-59 OPE2009-197 LQE2009-179 Link to ES Tech. Rep. Archives: OPE2009-197 LQE2009-179 |
Conference Information |
Committee |
OPE EMT LQE PN IEE-EMT |
Conference Date |
2010-01-28 - 2010-01-29 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
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Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
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Paper Information |
Registration To |
OPE |
Conference Code |
2010-01-OPE-EMT-LQE-PN-EMT |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Aluminum surface plasmon color filter |
Sub Title (in English) |
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Keyword(1) |
Surface plasmon |
Keyword(2) |
Plasma frequency |
Keyword(3) |
Electron beam lithography |
Keyword(4) |
Reactive ion etching |
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1st Author's Name |
Naoki Ikeda |
1st Author's Affiliation |
National Institute for Materials Science (National Inst. for Materials Science) |
2nd Author's Name |
Daiju Tsuya |
2nd Author's Affiliation |
National Institute for Materials Science (National Inst. for Materials Science) |
3rd Author's Name |
Yoshimasa Sugimoto |
3rd Author's Affiliation |
National Institute for Materials Science (National Inst. for Materials Science) |
4th Author's Name |
Yasuo Koide |
4th Author's Affiliation |
National Institute for Materials Science (National Inst. for Materials Science) |
5th Author's Name |
Atsushi Miura |
5th Author's Affiliation |
Toyota Central R&D Labs.,Inc. (Toyota CRDL) |
6th Author's Name |
Daisuke Inoue |
6th Author's Affiliation |
Toyota Central R&D Labs.,Inc. (Toyota CRDL) |
7th Author's Name |
Tsuyoshi Nomura |
7th Author's Affiliation |
Toyota Central R&D Labs.,Inc. (Toyota CRDL) |
8th Author's Name |
Hisayoshi Fujikawa |
8th Author's Affiliation |
Toyota Central R&D Labs.,Inc. (Toyota CRDL) |
9th Author's Name |
Kazuo Sato |
9th Author's Affiliation |
Toyota Central R&D Labs.,Inc. (Toyota CRDL) |
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Speaker |
Author-1 |
Date Time |
2010-01-29 14:25:00 |
Presentation Time |
25 minutes |
Registration for |
OPE |
Paper # |
PN2009-59, OPE2009-197, LQE2009-179 |
Volume (vol) |
vol.109 |
Number (no) |
no.401(PN), no.402(OPE), no.403(LQE) |
Page |
pp.129-132 |
#Pages |
4 |
Date of Issue |
2010-01-21 (PN, OPE, LQE) |
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