Paper Abstract and Keywords |
Presentation |
2010-02-22 15:40
Integration of Single-Electron Transistors Using Field-Emission-Induced Electromigration Shunsuke Ueno, Yusuke Tomoda, Watari Kume, Michinobu Hanada, Kazutoshi Takiya, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech.) ED2009-202 SDM2009-199 Link to ES Tech. Rep. Archives: ED2009-202 SDM2009-199 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We report a novel technique for the integration of planer-type single-electron transistors (SETs) based on nanogaps using electromigration scheme, which is caused by field emission current. We call this method “activation”. Using the activation method, the electrical properties of the nanogaps can be controlled by only adjusting the magnitude of the applied current during the activation process. Furthermore, we are easily able to obtain the SETs. The integration was achieved by passing a large electrical current through two initial Ni nanogap electrodes connected in series. The initial Ni nanogap electrodes with the separation of a few tens of nanometers were fabricated by conventional electron-beam lithography and lift-off process. The tunnel resistances of two nanogaps, which were both simultaneously activated, were decreased from the order of 100 TΩ to 1 MΩ with increasing the preset current Is from 1 nA to 30 µA. SETs were both simultaneously formed using the activation, and current-voltage (I-V) characteristics exhibited clear suppression of conductance near zero bias voltage known as the Coulomb Blockade. Coulomb blockade voltage of each device was also obviously modulated by the gate voltage. The charging energy of both SETs decreased simultaneously with increasing the preset current. This tendency was quite similar to those of individually activated SETs. These results clearly indicate that the activation procedure allows us to easily and simply integrate planar-type Ni-based SETs. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
electromigration / field emission current / nanogap / single-electron transistor / integration / / / |
Reference Info. |
IEICE Tech. Rep., vol. 109, no. 422, ED2009-202, pp. 35-39, Feb. 2010. |
Paper # |
ED2009-202 |
Date of Issue |
2010-02-15 (ED, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2009-202 SDM2009-199 Link to ES Tech. Rep. Archives: ED2009-202 SDM2009-199 |
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