| IEICE Technical Committee Submission System Conference Paper's Information |
Online Proceedings [Sign in] Tech. Rep. Archives |
| Go Top Page | Go Previous | [Japanese] / [English] |
| Paper Abstract and Keywords | ||
| Presentation | 2010-07-30 09:55 Atomic layer deposition (ALD) of vanadium nitride films using TDEAV Mayumi B. Takeyama, Masaru Sato (kitami Inst. of Tech.), Hiroshi Sudoh, Hideaki Machida (Gas-phase Growth Ltd.), Shun Ito, Eiji Aoyagi (Tohoku Univ.), Atsushi Noya (kitami inst. of tech.)  CPM2010-37 Link to ES Tech. Rep. Archives: CPM2010-37 |
|
| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | An extremely thin barrier deposited at a low temperature is desired in Cu interconnects of 32 nm node technologies. We propose the VNx barrier grown by atomic layer deposition using tetrakisdiethylamidovanadium (TDEAV) and NH3 as precursors, because we already demonsrated the usefulness of the VNx barrier deposited by reactive sputtering. In this study, we mainly examine the ALD growth condition of the VNx barrier. As a result, we can demonstrate that the VNx film is deposited at a low temperature of ~190 °C by ALD growth without the incubation time, and the growth rate is about 0.1nm/cycle. These results reveal that the ALD-VNx barrier in this study is one of the superior barriers examined so far. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Cu interconnects / extremely thin barrier / TDEAV / atomic layer deposition / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 110, no. 154, CPM2010-37, pp. 35-38, July 2010. | |
| Paper # | CPM2010-37 | |
| Date of Issue | 2010-07-22 (CPM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | CPM2010-37 Link to ES Tech. Rep. Archives: CPM2010-37 |
|
| Conference Information | |
| Committee | CPM |
| Conference Date | 2010-07-29 - 2010-07-30 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Michino-Eki Shari Meeting Room |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2010-07-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Atomic layer deposition (ALD) of vanadium nitride films using TDEAV |
| Sub Title (in English) | |
| Keyword(1) | Cu interconnects |
| Keyword(2) | extremely thin barrier |
| Keyword(3) | TDEAV |
| Keyword(4) | atomic layer deposition |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Mayumi B. Takeyama |
| 1st Author's Affiliation | Kitami Institute of Technology (kitami Inst. of Tech.) |
| 2nd Author's Name | Masaru Sato |
| 2nd Author's Affiliation | Kitami Institute of Technology (kitami Inst. of Tech.) |
| 3rd Author's Name | Hiroshi Sudoh |
| 3rd Author's Affiliation | Gas-phase Growth Ltd. (Gas-phase Growth Ltd.) |
| 4th Author's Name | Hideaki Machida |
| 4th Author's Affiliation | Gas-phase Growth Ltd. (Gas-phase Growth Ltd.) |
| 5th Author's Name | Shun Ito |
| 5th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 6th Author's Name | Eiji Aoyagi |
| 6th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 7th Author's Name | Atsushi Noya |
| 7th Author's Affiliation | Kitami Institute of Technology (kitami inst. of tech.) |
| 8th Author's Name | |
| 8th Author's Affiliation | () |
| 9th Author's Name | |
| 9th Author's Affiliation | () |
| 10th Author's Name | |
| 10th Author's Affiliation | () |
| 11th Author's Name | |
| 11th Author's Affiliation | () |
| 12th Author's Name | |
| 12th Author's Affiliation | () |
| 13th Author's Name | |
| 13th Author's Affiliation | () |
| 14th Author's Name | |
| 14th Author's Affiliation | () |
| 15th Author's Name | |
| 15th Author's Affiliation | () |
| 16th Author's Name | |
| 16th Author's Affiliation | () |
| 17th Author's Name | |
| 17th Author's Affiliation | () |
| 18th Author's Name | |
| 18th Author's Affiliation | () |
| Speaker | Author-1 |
| Date Time | 2010-07-30 09:55:00 |
| Presentation Time | 25 minutes |
| Registration for | CPM |
| Paper # | CPM2010-37 |
| Volume (vol) | vol.110 |
| Number (no) | no.154 |
| Page | pp.35-38 |
| #Pages | 4 |
| Date of Issue | 2010-07-22 (CPM) |
[Return to Top Page]