Paper Abstract and Keywords |
Presentation |
2011-04-22 15:50
Photosensitivity in extremely high index contrast silica-based waveguides on Si Makoto Abe, Masayuki Itoh, Toshimi Kominato, Yusuke Nasu, Mikitaka Itoh (NTT Corp. Photonics Labs.) R2011-7 CPM2011-7 OPE2011-7 Link to ES Tech. Rep. Archives: CPM2011-7 OPE2011-7 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We demonstrate the photosensitivity of an extremely high index contrast Ta2O5-doped silica and SiON waveguide using an arrayed-waveguide grating multi/demultiplexer. We investigated the UV induced refractive index change and insertion loss increase. We also investigated their thermal relaxation. We observed large increase of the insertion loss due to UV irradiation and found the difference of thermal relaxation in the UV induced n and IL. We also demonstrated large photosensitivity in 7.7%-D SiON waveguide, whitch was up to 2.4 x 10-3 and enough large for optical path trimming applications. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
photosensitivity / silica / PLC / waveguide / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 111, no. 16, OPE2011-7, pp. 27-31, April 2011. |
Paper # |
OPE2011-7 |
Date of Issue |
2011-04-15 (R, CPM, OPE) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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R2011-7 CPM2011-7 OPE2011-7 Link to ES Tech. Rep. Archives: CPM2011-7 OPE2011-7 |
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