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Paper Abstract and Keywords
Presentation 2011-04-22 15:50
Photosensitivity in extremely high index contrast silica-based waveguides on Si
Makoto Abe, Masayuki Itoh, Toshimi Kominato, Yusuke Nasu, Mikitaka Itoh (NTT Corp. Photonics Labs.) R2011-7 CPM2011-7 OPE2011-7 Link to ES Tech. Rep. Archives: CPM2011-7 OPE2011-7
Abstract (in Japanese) (See Japanese page) 
(in English) We demonstrate the photosensitivity of an extremely high index contrast Ta2O5-doped silica and SiON waveguide using an arrayed-waveguide grating multi/demultiplexer. We investigated the UV induced refractive index change and insertion loss increase. We also investigated their thermal relaxation. We observed large increase of the insertion loss due to UV irradiation and found the difference of thermal relaxation in the UV induced n and IL. We also demonstrated large photosensitivity in 7.7%-D SiON waveguide, whitch was up to 2.4 x 10-3 and enough large for optical path trimming applications.
Keyword (in Japanese) (See Japanese page) 
(in English) photosensitivity / silica / PLC / waveguide / / / /  
Reference Info. IEICE Tech. Rep., vol. 111, no. 16, OPE2011-7, pp. 27-31, April 2011.
Paper # OPE2011-7 
Date of Issue 2011-04-15 (R, CPM, OPE) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF R2011-7 CPM2011-7 OPE2011-7 Link to ES Tech. Rep. Archives: CPM2011-7 OPE2011-7

Conference Information
Committee OPE R CPM  
Conference Date 2011-04-22 - 2011-04-22 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To OPE 
Conference Code 2011-04-OPE-R-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Photosensitivity in extremely high index contrast silica-based waveguides on Si 
Sub Title (in English)  
Keyword(1) photosensitivity  
Keyword(2) silica  
Keyword(3) PLC  
Keyword(4) waveguide  
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1st Author's Name Makoto Abe  
1st Author's Affiliation NIPPON TELEGRAPH AND TELEPHONE Corp. (NTT Corp. Photonics Labs.)
2nd Author's Name Masayuki Itoh  
2nd Author's Affiliation NIPPON TELEGRAPH AND TELEPHONE Corp. (NTT Corp. Photonics Labs.)
3rd Author's Name Toshimi Kominato  
3rd Author's Affiliation NIPPON TELEGRAPH AND TELEPHONE Corp. (NTT Corp. Photonics Labs.)
4th Author's Name Yusuke Nasu  
4th Author's Affiliation NIPPON TELEGRAPH AND TELEPHONE Corp. (NTT Corp. Photonics Labs.)
5th Author's Name Mikitaka Itoh  
5th Author's Affiliation NIPPON TELEGRAPH AND TELEPHONE Corp. (NTT Corp. Photonics Labs.)
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Speaker Author-1 
Date Time 2011-04-22 15:50:00 
Presentation Time 25 minutes 
Registration for OPE 
Paper # R2011-7, CPM2011-7, OPE2011-7 
Volume (vol) vol.111 
Number (no) no.14(R), no.15(CPM), no.16(OPE) 
Page pp.27-31 
#Pages
Date of Issue 2011-04-15 (R, CPM, OPE) 


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