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Paper Abstract and Keywords
Presentation 2011-05-20 17:05
Study on AlInN barrier layer of GaInN channel HFET
Kazuya Ikeda, Yasuhiro Isobe, Hiromichi Ikki, Naofumi Horio, Tatsuyuki Sakakibara, Motoaki Iwaya, Tetsuya Takeuchi, Satoshi Kamiyama (Meijo Univ.), Isamu Akasaki (Meijo Univ./Nagoya Univ.), Hiroshi Amano (Nagoya Univ.) ED2011-35 CPM2011-42 SDM2011-48 Link to ES Tech. Rep. Archives: ED2011-35 CPM2011-42 SDM2011-48
Abstract (in Japanese) (See Japanese page) 
(in English) GaInN channel heterostructure field-effect transistors (HFETs) are promising for applications involving high operation current because they spontaneously produce high-density sheet carriers and strongly confine two-dimensional electron gases (2DEGs) owing to their large conduction band offset, and the large polarization charges. HFET using an AlInN barrier layer is also promising for a lattice-matched large-bandgap barrier structure. In addition, the MOVPE growth conditions for GaInN channel and AlInN barriers are similar. Thus, the combination of these materials is expected to achieve high-performance HFETs.
In this study, we report on the electrical properties of AlInN/GaInN based heterostructures fabricated on a GaN template. We also fabricated and characterized AlInN/GaInN HFETs.
Keyword (in Japanese) (See Japanese page) 
(in English) AlInN / GaInN / AlN / HFET / / / /  
Reference Info. IEICE Tech. Rep., vol. 111, no. 44, ED2011-35, pp. 179-183, May 2011.
Paper # ED2011-35 
Date of Issue 2011-05-12 (ED, CPM, SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2011-35 CPM2011-42 SDM2011-48 Link to ES Tech. Rep. Archives: ED2011-35 CPM2011-42 SDM2011-48

Conference Information
Committee CPM SDM ED  
Conference Date 2011-05-19 - 2011-05-20 
Place (in Japanese) (See Japanese page) 
Place (in English) Nagoya Univ. (VBL) 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To ED 
Conference Code 2011-05-CPM-SDM-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Study on AlInN barrier layer of GaInN channel HFET 
Sub Title (in English)  
Keyword(1) AlInN  
Keyword(2) GaInN  
Keyword(3) AlN  
Keyword(4) HFET  
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Keyword(8)  
1st Author's Name Kazuya Ikeda  
1st Author's Affiliation Meijo University (Meijo Univ.)
2nd Author's Name Yasuhiro Isobe  
2nd Author's Affiliation Meijo University (Meijo Univ.)
3rd Author's Name Hiromichi Ikki  
3rd Author's Affiliation Meijo University (Meijo Univ.)
4th Author's Name Naofumi Horio  
4th Author's Affiliation Meijo University (Meijo Univ.)
5th Author's Name Tatsuyuki Sakakibara  
5th Author's Affiliation Meijo University (Meijo Univ.)
6th Author's Name Motoaki Iwaya  
6th Author's Affiliation Meijo University (Meijo Univ.)
7th Author's Name Tetsuya Takeuchi  
7th Author's Affiliation Meijo University (Meijo Univ.)
8th Author's Name Satoshi Kamiyama  
8th Author's Affiliation Meijo University (Meijo Univ.)
9th Author's Name Isamu Akasaki  
9th Author's Affiliation Meijo University/Nagoya University (Meijo Univ./Nagoya Univ.)
10th Author's Name Hiroshi Amano  
10th Author's Affiliation Nagoya University (Nagoya Univ.)
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Speaker Author-1 
Date Time 2011-05-20 17:05:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2011-35, CPM2011-42, SDM2011-48 
Volume (vol) vol.111 
Number (no) no.44(ED), no.45(CPM), no.46(SDM) 
Page pp.179-183 
#Pages
Date of Issue 2011-05-12 (ED, CPM, SDM) 


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