Paper Abstract and Keywords |
Presentation |
2011-05-20 17:05
Study on AlInN barrier layer of GaInN channel HFET Kazuya Ikeda, Yasuhiro Isobe, Hiromichi Ikki, Naofumi Horio, Tatsuyuki Sakakibara, Motoaki Iwaya, Tetsuya Takeuchi, Satoshi Kamiyama (Meijo Univ.), Isamu Akasaki (Meijo Univ./Nagoya Univ.), Hiroshi Amano (Nagoya Univ.) ED2011-35 CPM2011-42 SDM2011-48 Link to ES Tech. Rep. Archives: ED2011-35 CPM2011-42 SDM2011-48 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
GaInN channel heterostructure field-effect transistors (HFETs) are promising for applications involving high operation current because they spontaneously produce high-density sheet carriers and strongly confine two-dimensional electron gases (2DEGs) owing to their large conduction band offset, and the large polarization charges. HFET using an AlInN barrier layer is also promising for a lattice-matched large-bandgap barrier structure. In addition, the MOVPE growth conditions for GaInN channel and AlInN barriers are similar. Thus, the combination of these materials is expected to achieve high-performance HFETs.
In this study, we report on the electrical properties of AlInN/GaInN based heterostructures fabricated on a GaN template. We also fabricated and characterized AlInN/GaInN HFETs. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
AlInN / GaInN / AlN / HFET / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 111, no. 44, ED2011-35, pp. 179-183, May 2011. |
Paper # |
ED2011-35 |
Date of Issue |
2011-05-12 (ED, CPM, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2011-35 CPM2011-42 SDM2011-48 Link to ES Tech. Rep. Archives: ED2011-35 CPM2011-42 SDM2011-48 |
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