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| Presentation | 2011-08-11 09:25 Preparation of Transparent Conducting AZO Thin Films by RF Magnetron Sputtering Takeshi Umehara, Satoru Noge (Numazu NCT)  CPM2011-67 Link to ES Tech. Rep. Archives: CPM2011-67 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In this study, the results of the study of thin film deposition conditions of AZO thin film by RF magnetron sputtering method were reported. AZO thin films have been prepared by RF reactive magnetron sputtering with various growth parameters, including Al-doping amount on Zn target, oxygen pressure ratio and substrate temperatures. The resistivity, transmittance and crystal orientation of these films was investigated as a function of various growth parameters and causes of characteristic change were examined. As a result, a minimum resistivity of 4.38×$10^{-4}$$\Omega$cm and the average transmittance of 93% in the visible range was obtained for the films deposited at oxygen pressure ratio of 12%, Al-doping ratio of 4% and substrate temperature of 350℃. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | AZO thin film / Transparent Conductive Oxide / RF magnetron sputtering / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 111, no. 176, CPM2011-67, pp. 55-60, Aug. 2011. | |
| Paper # | CPM2011-67 | |
| Date of Issue | 2011-08-03 (CPM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | CPM2011-67 Link to ES Tech. Rep. Archives: CPM2011-67 |
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| Conference Information | |
| Committee | CPM |
| Conference Date | 2011-08-10 - 2011-08-11 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2011-08-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Preparation of Transparent Conducting AZO Thin Films by RF Magnetron Sputtering |
| Sub Title (in English) | |
| Keyword(1) | AZO thin film |
| Keyword(2) | Transparent Conductive Oxide |
| Keyword(3) | RF magnetron sputtering |
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| 1st Author's Name | Takeshi Umehara |
| 1st Author's Affiliation | Numazu National College of Technology (Numazu NCT) |
| 2nd Author's Name | Satoru Noge |
| 2nd Author's Affiliation | Numazu National College of Technology (Numazu NCT) |
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| Speaker | Author-1 |
| Date Time | 2011-08-11 09:25:00 |
| Presentation Time | 25 minutes |
| Registration for | CPM |
| Paper # | CPM2011-67 |
| Volume (vol) | vol.111 |
| Number (no) | no.176 |
| Page | pp.55-60 |
| #Pages | 6 |
| Date of Issue | 2011-08-03 (CPM) |
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