Paper Abstract and Keywords |
Presentation |
2011-10-21 15:25
High Purity Metal Organic Gas Distribution System Satoru Yamashita, Hidekazu Ishii, Yoshinobu Shiba, Masafumi Kitano, Yasuyuki Shirai, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.) SDM2011-112 Link to ES Tech. Rep. Archives: SDM2011-112 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
The gas flow control is important factor that influenced to the concentration of process gas and the pressure of process chamber. In composite semiconductor manufacturing process that using metal organic (MO) gases, the flow control system that controls the flow rate of MO gas must be established to improve the film performance and reliability of film formation process. So, flow control system based on pressure measurement (FCS) for high temperature was developed and it is possible to control the flow rate of MO gases. Also, the concentration of MO gas was controlled with great accuracy. Furthermore, liquid source control system (LSCS) was developed for the purpose of reduction of MO gas distribution system area and thermal history. And the system that MO material only the quantity needed was vaporized and control the flow rate of MO gas was developed. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
metal organic gas / MOCVD / flow control system / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 111, no. 249, SDM2011-112, pp. 85-90, Oct. 2011. |
Paper # |
SDM2011-112 |
Date of Issue |
2011-10-13 (SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
SDM2011-112 Link to ES Tech. Rep. Archives: SDM2011-112 |
Conference Information |
Committee |
SDM |
Conference Date |
2011-10-20 - 2011-10-21 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Tohoku Univ. (Niche) |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Process science and new process technologies |
Paper Information |
Registration To |
SDM |
Conference Code |
2011-10-SDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
High Purity Metal Organic Gas Distribution System |
Sub Title (in English) |
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Keyword(1) |
metal organic gas |
Keyword(2) |
MOCVD |
Keyword(3) |
flow control system |
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1st Author's Name |
Satoru Yamashita |
1st Author's Affiliation |
Tohoku University (Tohoku Univ.) |
2nd Author's Name |
Hidekazu Ishii |
2nd Author's Affiliation |
Tohoku University (Tohoku Univ.) |
3rd Author's Name |
Yoshinobu Shiba |
3rd Author's Affiliation |
Tohoku University (Tohoku Univ.) |
4th Author's Name |
Masafumi Kitano |
4th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
5th Author's Name |
Yasuyuki Shirai |
5th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
6th Author's Name |
Shigetoshi Sugawa |
6th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
7th Author's Name |
Tadahiro Ohmi |
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Tohoku University (Tohoku Univ.) |
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Speaker |
Author-1 |
Date Time |
2011-10-21 15:25:00 |
Presentation Time |
25 minutes |
Registration for |
SDM |
Paper # |
SDM2011-112 |
Volume (vol) |
vol.111 |
Number (no) |
no.249 |
Page |
pp.85-90 |
#Pages |
6 |
Date of Issue |
2011-10-13 (SDM) |
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