Paper Abstract and Keywords |
Presentation |
2012-04-27 16:30
Crystallization of Si Thin Film on Poly-Imide Substrate by Semiconductor Blue Multi-Laser Diode Annealing Tatsuya Okada, Jean de Dieu Mugiraneza, Katsuya Shirai, Toshiharu Suzuki, Takashi Noguchi (Univ. Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-8 OME2012-8 Link to ES Tech. Rep. Archives: SDM2012-8 OME2012-8 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Crystallization of a-Si films on polyimide substrate was achieved using Blue Multi-Laser Diode Annealing. Surface roughness of crystallized films was smooth, and the crystallinity was almost 100% with uniform grains size of ~50 nm. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Blue Multi-Laser Diode Annealing / Sputtering / TFT / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 112, no. 18, SDM2012-8, pp. 37-39, April 2012. |
Paper # |
SDM2012-8 |
Date of Issue |
2012-04-20 (SDM, OME) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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SDM2012-8 OME2012-8 Link to ES Tech. Rep. Archives: SDM2012-8 OME2012-8 |
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