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Paper Abstract and Keywords
Presentation 2013-11-15 13:25
Characterization and analysis of deposition behavior of ultra-high density ferromagnetic nanodot arrays fabricated by electrochemical processes
Siggi Wodarz, Yuta Maniwa, Hiroki Hagiwara, Tomohiro Otani, Daiki Nishiie (Waseda Univ.), Giovanni Zangari (UVA), Takayuki Homma (Waseda Univ.) MR2013-20 Link to ES Tech. Rep. Archives: MR2013-20
Abstract (in Japanese) (See Japanese page) 
(in English) We fabricated hcp-Co80Pt20 and L10-FePt thin films and nanodot arrays onto hcp-Ru (002) / Si substrate by electrodeposition and lithography processes. The effect of applied potential and diameter of the nanodot on deposition behavior of Co-Pt was analyzed in order to control the deposition of Co-Pt. By using electron beam lithography, nanodot patterns with 10 nm diameter and 18 nm pitch were uniformly fabricated. It was suggested that the particle size of Co-Pt could be controlled by the applied potential, and in the case of relatively positive applied potential of - 400 mV and – 500 mV vs Ag / AgCl, progressive nucleation preferentially occurred to increase the size of each Co-Pt particle. The phase transformation from fcc-Fe-Pt to L10 Fe-Pt was observed by annealing at 650 oC, and Fe-Pt films with perpendicular coercivity of 9.0 kOe and 9.8 kOe with a thickness of 10 nm and 25 nm were obtained. In addition, Fe-Pt nanodot arrays having a pitch and a diameter of 100 nm and 35 nm were successfully fabricated by UV-nanoimprint lithography.
Keyword (in Japanese) (See Japanese page) 
(in English) BPM / Electrodeposition / Co-Pt / Fe-Pt / Electron Beam Lithography / UV-Nanoimprint Lithography / /  
Reference Info. IEICE Tech. Rep., vol. 113, Nov. 2013.
Paper #  
Date of Issue 2013-11-08 (MR) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF MR2013-20 Link to ES Tech. Rep. Archives: MR2013-20

Conference Information
Committee MRIS ITE-MMS  
Conference Date 2013-11-15 - 2013-11-15 
Place (in Japanese) (See Japanese page) 
Place (in English) Waseda Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Hard disk drive technology, etc. 
Paper Information
Registration To MRIS 
Conference Code 2013-11-MR-MMS 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Characterization and analysis of deposition behavior of ultra-high density ferromagnetic nanodot arrays fabricated by electrochemical processes 
Sub Title (in English)  
Keyword(1) BPM  
Keyword(2) Electrodeposition  
Keyword(3) Co-Pt  
Keyword(4) Fe-Pt  
Keyword(5) Electron Beam Lithography  
Keyword(6) UV-Nanoimprint Lithography  
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Keyword(8)  
1st Author's Name Siggi Wodarz  
1st Author's Affiliation Waseda University (Waseda Univ.)
2nd Author's Name Yuta Maniwa  
2nd Author's Affiliation Waseda University (Waseda Univ.)
3rd Author's Name Hiroki Hagiwara  
3rd Author's Affiliation Waseda University (Waseda Univ.)
4th Author's Name Tomohiro Otani  
4th Author's Affiliation Waseda University (Waseda Univ.)
5th Author's Name Daiki Nishiie  
5th Author's Affiliation Waseda University (Waseda Univ.)
6th Author's Name Giovanni Zangari  
6th Author's Affiliation University of Virginia (UVA)
7th Author's Name Takayuki Homma  
7th Author's Affiliation Waseda University (Waseda Univ.)
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Speaker Author-1 
Date Time 2013-11-15 13:25:00 
Presentation Time 25 minutes 
Registration for MRIS 
Paper # MR2013-20 
Volume (vol) vol.113 
Number (no) no.297 
Page pp.7-10 
#Pages
Date of Issue 2013-11-08 (MR) 


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