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Paper Abstract and Keywords
Presentation 2015-12-21 13:45
Effect of Temperature on DC and RF Characteristics of Cryogenic InP HEMTs
Akira Endoh (NICT/Fujitsu Labs.), Issei Watanabe, Akifumi Kasamatsu (NICT), Tsuyoshi Takahashi, Shoichi Shiba, Yasuhiro Nakasha, Taisuke Iwai (Fujitsu Labs.), Takashi Mimura (Fujitsu Labs./NICT) ED2015-92 Link to ES Tech. Rep. Archives: ED2015-92
Abstract (in Japanese) (See Japanese page) 
(in English) We measured the DC and RF characteristics of InP-based 75-nm-gate In0.52Al0.48As/In0.63Ga0.37As HEMTs at 300, 220, 150, 100, 77 and 16 K and clarified the effect of temperature on improvement of DC and RF performance. The obvious kink phenomenon is seen in the drain-source current vs. drain-source voltage (Ids-Vds) characteristics with decreasing
temperature. The maximum transconductance gm increases with decreasing temperature between 300 and 77 K and shows the almost same value at 100 and 77 K. At 16 K, the decrease in gm is seen. The decrease in gm at 16 K may result from the kink phenomenon. Cutoff frequency fT and maximum oscillation frequency fmax increase with decreasing temperature. The increase of fmax with decreasing temperature is more than that of fT. The fmax largely increases between 150 and 100 K. Furthermore, the increase of fT and fmax values is very small between 77 and 16 K. This suggests that operating InP HEMTs at 77 K is sufficient to increase fT and fmax values.
Keyword (in Japanese) (See Japanese page) 
(in English) HEMTs / InP / InAlAs/InGaAs / Cryogenic characteristics / Transconductance / Cutoff frequency / Maximum oscillation frequency /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 387, ED2015-92, pp. 7-11, Dec. 2015.
Paper # ED2015-92 
Date of Issue 2015-12-14 (ED) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2015-92 Link to ES Tech. Rep. Archives: ED2015-92

Conference Information
Committee ED  
Conference Date 2015-12-21 - 2015-12-22 
Place (in Japanese) (See Japanese page) 
Place (in English) RIEC, Tohoku Univ 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Millimeter-wave, terahertz-wave devices and systems 
Paper Information
Registration To ED 
Conference Code 2015-12-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Effect of Temperature on DC and RF Characteristics of Cryogenic InP HEMTs 
Sub Title (in English)  
Keyword(1) HEMTs  
Keyword(2) InP  
Keyword(3) InAlAs/InGaAs  
Keyword(4) Cryogenic characteristics  
Keyword(5) Transconductance  
Keyword(6) Cutoff frequency  
Keyword(7) Maximum oscillation frequency  
Keyword(8)  
1st Author's Name Akira Endoh  
1st Author's Affiliation National Institute of Information and Communications Technology/Fujitsu Laboratories Ltd. (NICT/Fujitsu Labs.)
2nd Author's Name Issei Watanabe  
2nd Author's Affiliation National Institute of Information and Communications Technology (NICT)
3rd Author's Name Akifumi Kasamatsu  
3rd Author's Affiliation National Institute of Information and Communications Technology (NICT)
4th Author's Name Tsuyoshi Takahashi  
4th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
5th Author's Name Shoichi Shiba  
5th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
6th Author's Name Yasuhiro Nakasha  
6th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
7th Author's Name Taisuke Iwai  
7th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
8th Author's Name Takashi Mimura  
8th Author's Affiliation Fujitsu Laboratories Ltd./National Institute of Information and Communications Technology (Fujitsu Labs./NICT)
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Speaker Author-1 
Date Time 2015-12-21 13:45:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2015-92 
Volume (vol) vol.115 
Number (no) no.387 
Page pp.7-11 
#Pages
Date of Issue 2015-12-14 (ED) 


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