Paper Abstract and Keywords |
Presentation |
2016-11-29 10:30
Accurate Lithography Simulation Model based on Deep Learning Yuki Watanabe, Tetsuaki Matsunawa, Taiki Kimura, Shigeki Nojima (Toshiba) VLD2016-56 DC2016-50 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Lithography simulation is an indispensable technology for today's semiconductor manufacturing processes. To achieve accurate simulation, a model which predicts wafer patterns based on optical features of design patterns has been proposed. However, it is difficult to define appropriate features. This paper proposes a new model using CNN (Convolutional Neural Network) which is a powerful technique from the field of deep learning. The CNN model automatically determines design pattern features, and predicts wafer patterns accurately. Experimental results show proposed CNN model can reduce the prediction error to 30% compared with the conventional method. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Lithography simulation / Resist Model / Deep learning / CNN / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 116, no. 330, VLD2016-56, pp. 73-78, Nov. 2016. |
Paper # |
VLD2016-56 |
Date of Issue |
2016-11-21 (VLD, DC) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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VLD2016-56 DC2016-50 |
Conference Information |
Committee |
VLD DC CPSY RECONF CPM ICD IE |
Conference Date |
2016-11-28 - 2016-11-30 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Ritsumeikan University, Osaka Ibaraki Campus |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Design Gaia 2016 -New Field of VLSI Design- |
Paper Information |
Registration To |
VLD |
Conference Code |
2016-11-VLD-DC-CPSY-RECONF-CPM-ICD-IE |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Accurate Lithography Simulation Model based on Deep Learning |
Sub Title (in English) |
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Keyword(1) |
Lithography simulation |
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Resist Model |
Keyword(3) |
Deep learning |
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CNN |
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1st Author's Name |
Yuki Watanabe |
1st Author's Affiliation |
Toshiba Corporation (Toshiba) |
2nd Author's Name |
Tetsuaki Matsunawa |
2nd Author's Affiliation |
Toshiba Corporation (Toshiba) |
3rd Author's Name |
Taiki Kimura |
3rd Author's Affiliation |
Toshiba Corporation (Toshiba) |
4th Author's Name |
Shigeki Nojima |
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Toshiba Corporation (Toshiba) |
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Speaker |
Author-1 |
Date Time |
2016-11-29 10:30:00 |
Presentation Time |
25 minutes |
Registration for |
VLD |
Paper # |
VLD2016-56, DC2016-50 |
Volume (vol) |
vol.116 |
Number (no) |
no.330(VLD), no.331(DC) |
Page |
pp.73-78 |
#Pages |
6 |
Date of Issue |
2016-11-21 (VLD, DC) |
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