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| Presentation | 2019-06-21 14:30 [Invited Lecture] Observation of three dimensional atomic arrangements of active and inactive impurities heavy doped in silicon by using photoelectron holography method Kazuo Tsutsui (Tokyo Tech), Tomohiro Matsushita (JASRI), Kotaro Natori, Tatsuhiro Ogawa (Tokyo Tech), Takayuki Muro (JASRI), Yoshitada Morikawa (Osaka Univ.), Takuya Hoshii, Kuniyuki Kakushima, Hitoshi Wakabayashi (Tokyo Tech), Kouichi Hayashi (Nagoya Inst. Tech.), Fumihiko Matsui (Inst. Molecular Science), Toyohiko Kinoshita (JASRI)  SDM2019-30 Link to ES Tech. Rep. Archives: SDM2019-30 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Photoelectron holography method combined with first-principles simulations determined the local three-dimensional atomic structures of arsenic (As) atoms doped in a silicon (Si) crystal. Presence of the three types of As atomic structures were revealed; electrically active As occupying substitutional sites, electrically inactive As embedded in the AsnV(n=2~4) type clusters, and electrically inactive As in locally disordered structures. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | photoelectron holography / impurity / dopant / cluster / arsenic (As) / silicon (Si) / / | |
| Reference Info. | IEICE Tech. Rep., vol. 119, no. 96, SDM2019-30, pp. 23-27, June 2019. | |
| Paper # | SDM2019-30 | |
| Date of Issue | 2019-06-14 (SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2019-30 Link to ES Tech. Rep. Archives: SDM2019-30 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2019-06-21 - 2019-06-21 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Nagoya Univ. VBL3F |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Material Science and Process Technology for MOS Devices and Memories |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2019-06-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Observation of three dimensional atomic arrangements of active and inactive impurities heavy doped in silicon by using photoelectron holography method |
| Sub Title (in English) | |
| Keyword(1) | photoelectron holography |
| Keyword(2) | impurity |
| Keyword(3) | dopant |
| Keyword(4) | cluster |
| Keyword(5) | arsenic (As) |
| Keyword(6) | silicon (Si) |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Kazuo Tsutsui |
| 1st Author's Affiliation | Tokyo Institute of Technology (Tokyo Tech) |
| 2nd Author's Name | Tomohiro Matsushita |
| 2nd Author's Affiliation | Japan Synchrotron Radiation Research Institute (JASRI) |
| 3rd Author's Name | Kotaro Natori |
| 3rd Author's Affiliation | Tokyo Institute of Technology (Tokyo Tech) |
| 4th Author's Name | Tatsuhiro Ogawa |
| 4th Author's Affiliation | Tokyo Institute of Technology (Tokyo Tech) |
| 5th Author's Name | Takayuki Muro |
| 5th Author's Affiliation | Japan Synchrotron Radiation Research Institute (JASRI) |
| 6th Author's Name | Yoshitada Morikawa |
| 6th Author's Affiliation | Osaka University (Osaka Univ.) |
| 7th Author's Name | Takuya Hoshii |
| 7th Author's Affiliation | Tokyo Institute of Technology (Tokyo Tech) |
| 8th Author's Name | Kuniyuki Kakushima |
| 8th Author's Affiliation | Tokyo Institute of Technology (Tokyo Tech) |
| 9th Author's Name | Hitoshi Wakabayashi |
| 9th Author's Affiliation | Tokyo Institute of Technology (Tokyo Tech) |
| 10th Author's Name | Kouichi Hayashi |
| 10th Author's Affiliation | Nagoya Institute of Technology (Nagoya Inst. Tech.) |
| 11th Author's Name | Fumihiko Matsui |
| 11th Author's Affiliation | Institute for Molecular Science (Inst. Molecular Science) |
| 12th Author's Name | Toyohiko Kinoshita |
| 12th Author's Affiliation | Japan Synchrotron Radiation Research Institute (JASRI) |
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| 14th Author's Affiliation | () |
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| 15th Author's Affiliation | () |
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| 16th Author's Affiliation | () |
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| 17th Author's Affiliation | () |
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| 18th Author's Affiliation | () |
| Speaker | Author-1 |
| Date Time | 2019-06-21 14:30:00 |
| Presentation Time | 30 minutes |
| Registration for | SDM |
| Paper # | SDM2019-30 |
| Volume (vol) | vol.119 |
| Number (no) | no.96 |
| Page | pp.23-27 |
| #Pages | 5 |
| Date of Issue | 2019-06-14 (SDM) |
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