Paper Abstract and Keywords |
Presentation |
2019-10-24 15:10
Resistance Measurement Platform for Statistical Evaluation of Emerging Memory Materials with High Accuracy Takeru Maeda, Yuya Omura, Rihito Kuroda, Akinobu Teramoto, Tomoyuki Suwa, Shigetoshi Sugawa (Tohoku Univ.) SDM2019-65 Link to ES Tech. Rep. Archives: SDM2019-65 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
A high precision 1 Ω – 10 MΩ range resistance measurement platform is presented. The developed platform excludes on-resistance of selectors, resulting in high measurement accuracy across the measurement range of 1 Ω – 10 MΩ. The developed platform can accurately measure the resistance of various memory materials on a large scale of 360,000 cells within 50 ms. Various memory materials can be tested only by forming them on top of the platform. We can commonly use the platform regardless of memory materials. We verified the circuit operation by measuring 6,000 Poly-Si cells. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
emerging memories / resistance measurement / statistical evaluation / platform / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 119, no. 239, SDM2019-65, pp. 59-64, Oct. 2019. |
Paper # |
SDM2019-65 |
Date of Issue |
2019-10-16 (SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
SDM2019-65 Link to ES Tech. Rep. Archives: SDM2019-65 |
Conference Information |
Committee |
SDM |
Conference Date |
2019-10-23 - 2019-10-24 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Niche, Tohoku Univ. |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Process Science and New Process Technology |
Paper Information |
Registration To |
SDM |
Conference Code |
2019-10-SDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Resistance Measurement Platform for Statistical Evaluation of Emerging Memory Materials with High Accuracy |
Sub Title (in English) |
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Keyword(1) |
emerging memories |
Keyword(2) |
resistance measurement |
Keyword(3) |
statistical evaluation |
Keyword(4) |
platform |
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1st Author's Name |
Takeru Maeda |
1st Author's Affiliation |
Tohoku University (Tohoku Univ.) |
2nd Author's Name |
Yuya Omura |
2nd Author's Affiliation |
Tohoku University (Tohoku Univ.) |
3rd Author's Name |
Rihito Kuroda |
3rd Author's Affiliation |
Tohoku University (Tohoku Univ.) |
4th Author's Name |
Akinobu Teramoto |
4th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
5th Author's Name |
Tomoyuki Suwa |
5th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
6th Author's Name |
Shigetoshi Sugawa |
6th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
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Speaker |
Author-1 |
Date Time |
2019-10-24 15:10:00 |
Presentation Time |
30 minutes |
Registration for |
SDM |
Paper # |
SDM2019-65 |
Volume (vol) |
vol.119 |
Number (no) |
no.239 |
Page |
pp.59-64 |
#Pages |
6 |
Date of Issue |
2019-10-16 (SDM) |
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