Paper Abstract and Keywords |
Presentation |
2020-03-04 16:25
Machine Learning Based Lithography Hotspot Detection Method and Evaluation Hidekazu Takahashi, Shimpei Sato, Atsushi Takahashi (Tokyo Tech) VLD2019-106 HWS2019-79 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
As VLSI device feature sizes are getting smaller and smaller, layout design
has become more important to keep the yield.
Machine learning based method is one of the candidates to detect layout
patterns which cause yield loss, called hotspots.
ICCAD2012 contest dataset is widely used to evaluate machine learning based
methods, however, training-set and test-set contain the identical data.
In order to evaluate these methods appropriately, it is necessary to evaluate
the ability of them by using the data that are not contained in training-set.
Original ICCAD2012 dataset does not fit to this purpose.
In practice, even minor nm-level variations of a non-hotspot could become a hotspot.
ICCAD2012 dataset include no such data.
In this paper, we re-evaluate the existing machine learning based methods using the new dataset developed recently. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Hotspot / Dataset / Machine Learning / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 119, no. 443, VLD2019-106, pp. 71-76, March 2020. |
Paper # |
VLD2019-106 |
Date of Issue |
2020-02-26 (VLD, HWS) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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VLD2019-106 HWS2019-79 |
Conference Information |
Committee |
HWS VLD |
Conference Date |
2020-03-04 - 2020-03-07 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Okinawa Ken Seinen Kaikan |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Design Technology for System-on-Silicon, Hardware Security, etc. |
Paper Information |
Registration To |
VLD |
Conference Code |
2020-03-HWS-VLD |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Machine Learning Based Lithography Hotspot Detection Method and Evaluation |
Sub Title (in English) |
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Hotspot |
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Machine Learning |
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1st Author's Name |
Hidekazu Takahashi |
1st Author's Affiliation |
Tokyo Institute of Technology (Tokyo Tech) |
2nd Author's Name |
Shimpei Sato |
2nd Author's Affiliation |
Tokyo Institute of Technology (Tokyo Tech) |
3rd Author's Name |
Atsushi Takahashi |
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Tokyo Institute of Technology (Tokyo Tech) |
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Speaker |
Author-1 |
Date Time |
2020-03-04 16:25:00 |
Presentation Time |
25 minutes |
Registration for |
VLD |
Paper # |
VLD2019-106, HWS2019-79 |
Volume (vol) |
vol.119 |
Number (no) |
no.443(VLD), no.444(HWS) |
Page |
pp.71-76 |
#Pages |
6 |
Date of Issue |
2020-02-26 (VLD, HWS) |
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