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| Presentation | 2020-03-04 16:50 Additional Training Data Generation for Lithography Hotspot Detection by Modifying Existing Training Data Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi (Hiroshima City Univ.)  VLD2019-107 HWS2019-80 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In lithography, a circuit pattern that is highly likely to cause an undesired open- and short-circuit after transfer is called a hotspot.Since hotspots cause a lower yield, they need to be detected and removed at the design stage.In recent years, several methods based on machine learning have been proposed as a fast hotspot candidates detection methods, but there have been problems in the number of data of existing circuit pattern data set and the validities of the original labels.In this study, the validities of the labels given in the existing circuit pattern data set is analyzed using the optical simulation, and additionally generate the training data by modifying the data set. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | lithography / hotspot / data set / optical simulation / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 119, no. 443, VLD2019-107, pp. 77-82, March 2020. | |
| Paper # | VLD2019-107 | |
| Date of Issue | 2020-02-26 (VLD, HWS) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | VLD2019-107 HWS2019-80 |
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| Conference Information | |
| Committee | HWS VLD |
| Conference Date | 2020-03-04 - 2020-03-07 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Okinawa Ken Seinen Kaikan |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Technology for System-on-Silicon, Hardware Security, etc. |
| Paper Information | |
| Registration To | VLD |
| Conference Code | 2020-03-HWS-VLD |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Additional Training Data Generation for Lithography Hotspot Detection by Modifying Existing Training Data |
| Sub Title (in English) | |
| Keyword(1) | lithography |
| Keyword(2) | hotspot |
| Keyword(3) | data set |
| Keyword(4) | optical simulation |
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| 1st Author's Name | Gaku Kataoka |
| 1st Author's Affiliation | Hiroshima City University (Hiroshima City Univ.) |
| 2nd Author's Name | Masato Inagi |
| 2nd Author's Affiliation | Hiroshima City University (Hiroshima City Univ.) |
| 3rd Author's Name | Shinobu Nagayama |
| 3rd Author's Affiliation | Hiroshima City University (Hiroshima City Univ.) |
| 4th Author's Name | Shin'ichi Wakabayashi |
| 4th Author's Affiliation | Hiroshima City University (Hiroshima City Univ.) |
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| Speaker | Author-1 |
| Date Time | 2020-03-04 16:50:00 |
| Presentation Time | 25 minutes |
| Registration for | VLD |
| Paper # | VLD2019-107, HWS2019-80 |
| Volume (vol) | vol.119 |
| Number (no) | no.443(VLD), no.444(HWS) |
| Page | pp.77-82 |
| #Pages | 6 |
| Date of Issue | 2020-02-26 (VLD, HWS) |
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