Paper Abstract and Keywords |
Presentation |
2021-10-21 10:45
[Invited Talk]
Influence of Fluorine on Reliabilities of SiO2 and SixNy Films Yuichiro Mitani (Tokyo City Univ.) SDM2021-44 Link to ES Tech. Rep. Archives: SDM2021-44 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
In this paper, the influence of Fluorine incorporation into SiO2 and Si nitride (SixNy) films which are widely used in the nano electronics has been investigated. In the SixNy film, fluorine makes the electron trap level shallower with increasing F dosage. On the other hand, as previously reported in the literatures, fluorine improves SiO2/Si interfaces and bulk though, an excess fluorine degrades the SiO2 film markedly. Re-considering the control of Fluorine incorporation becomes important for realizing highly reliable devices. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Silicon dioxide / Silicon nitride film / Fluorine / Reliability / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 121, no. 212, SDM2021-44, pp. 1-4, Oct. 2021. |
Paper # |
SDM2021-44 |
Date of Issue |
2021-10-14 (SDM) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
SDM2021-44 Link to ES Tech. Rep. Archives: SDM2021-44 |
Conference Information |
Committee |
SDM |
Conference Date |
2021-10-21 - 2021-10-21 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Online |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Process Science and New Process Technology |
Paper Information |
Registration To |
SDM |
Conference Code |
2021-10-SDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Influence of Fluorine on Reliabilities of SiO2 and SixNy Films |
Sub Title (in English) |
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Keyword(1) |
Silicon dioxide |
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Silicon nitride film |
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Fluorine |
Keyword(4) |
Reliability |
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1st Author's Name |
Yuichiro Mitani |
1st Author's Affiliation |
Tokyo City University (Tokyo City Univ.) |
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Speaker |
Author-1 |
Date Time |
2021-10-21 10:45:00 |
Presentation Time |
50 minutes |
Registration for |
SDM |
Paper # |
SDM2021-44 |
Volume (vol) |
vol.121 |
Number (no) |
no.212 |
Page |
pp.1-4 |
#Pages |
4 |
Date of Issue |
2021-10-14 (SDM) |