Paper Abstract and Keywords |
Presentation |
2022-02-04 11:20
[Invited Talk]
3D Sequential Process Integration for CMOS Image Sensor Keiichi Nakazawa, Junpei Yamamoto, Nobutoshi Fujii, Mutsuo Uehara, Katsunori Hiramatsu, Hideomi Kumano, Shigetaka Mori, Shintaro Okamoto, Akito Shimizu, Koichi Baba, Hidetoshi Onuma, Akira Matsumoto, Koichiro Zaitsu, Keiji Tanani, Tomoyuki Hirano, Hayato Iwamoto (Sony Semiconductor Solutions) SDM2021-77 Link to ES Tech. Rep. Archives: SDM2021-77 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We developed a new structure of pixel transistors stacked over photodiode named “2-Layer Transistor Pixel Stacked CMOS Image Sensor” (2-Layer Pixel). It was fabricated by 3D sequential process integration with new process techniques, such as thermally stable wafer bonding and deep contacts. With this technology, we successfully increased AMP size and demonstrated backside-illuminated CMOS image sensor of 6752 x 4928 pixels at 0.7um pitch to prove its functionality and integrity. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
3D Sequential / 2-Layer Pixel / wafer bonding / deep contact / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 121, no. 366, SDM2021-77, pp. 13-16, Feb. 2022. |
Paper # |
SDM2021-77 |
Date of Issue |
2022-01-28 (SDM) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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Download PDF |
SDM2021-77 Link to ES Tech. Rep. Archives: SDM2021-77 |