Paper Abstract and Keywords |
Presentation |
2022-06-21 17:20
Formation of Ultra-Thin Nickel Silicide Layer with controlled Surface Morphology and Crystalline Phase on SiO2 Keisuke Kimura, Noriyuki Taoka, Shunsuke Nishimura, Akio Ohta, Katsunori Makihara, Seiichi Miyazaki (Nagoya. Univ) SDM2022-31 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Recently, a device with metal nanosheet (MNS) has been attracted much attention. However, control of surface morphology and crystalline phase of MNS on SiO2 is not enough for realizing the device. Formation of nickel silicide NS was challenged using a solid phase interdiffusion method, which contains deposition of different thicknesses of Ni and Si films on SiO2 and subsequent annealing. As a result, we found that reactions of oxidation and reduction have an important role when silicidation occurs in MNS. In a thick nickel silicide film, several types of crystalline phases exist after annealing. In this study, the nickel silicide NS with only Ni2Si phase and smooth surface is successfully formed. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Thin film / Crystalline phase / Chemical bonding feature / Surface morphology / Metal-Silicide / / / |
Reference Info. |
IEICE Tech. Rep., vol. 122, no. 84, SDM2022-31, pp. 27-30, June 2022. |
Paper # |
SDM2022-31 |
Date of Issue |
2022-06-14 (SDM) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
SDM2022-31 |
Conference Information |
Committee |
SDM |
Conference Date |
2022-06-21 - 2022-06-21 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Nagoya Univ. VBL3F |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Material Science and Process Technology for MOS Devices, Memories, and Power Devices |
Paper Information |
Registration To |
SDM |
Conference Code |
2022-06-SDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Formation of Ultra-Thin Nickel Silicide Layer with controlled Surface Morphology and Crystalline Phase on SiO2 |
Sub Title (in English) |
|
Keyword(1) |
Thin film |
Keyword(2) |
Crystalline phase |
Keyword(3) |
Chemical bonding feature |
Keyword(4) |
Surface morphology |
Keyword(5) |
Metal-Silicide |
Keyword(6) |
|
Keyword(7) |
|
Keyword(8) |
|
1st Author's Name |
Keisuke Kimura |
1st Author's Affiliation |
Nagoya University (Nagoya. Univ) |
2nd Author's Name |
Noriyuki Taoka |
2nd Author's Affiliation |
Nagoya University (Nagoya. Univ) |
3rd Author's Name |
Shunsuke Nishimura |
3rd Author's Affiliation |
Nagoya University (Nagoya. Univ) |
4th Author's Name |
Akio Ohta |
4th Author's Affiliation |
Nagoya University (Nagoya. Univ) |
5th Author's Name |
Katsunori Makihara |
5th Author's Affiliation |
Nagoya University (Nagoya. Univ) |
6th Author's Name |
Seiichi Miyazaki |
6th Author's Affiliation |
Nagoya University (Nagoya. Univ) |
7th Author's Name |
|
7th Author's Affiliation |
() |
8th Author's Name |
|
8th Author's Affiliation |
() |
9th Author's Name |
|
9th Author's Affiliation |
() |
10th Author's Name |
|
10th Author's Affiliation |
() |
11th Author's Name |
|
11th Author's Affiliation |
() |
12th Author's Name |
|
12th Author's Affiliation |
() |
13th Author's Name |
|
13th Author's Affiliation |
() |
14th Author's Name |
|
14th Author's Affiliation |
() |
15th Author's Name |
|
15th Author's Affiliation |
() |
16th Author's Name |
|
16th Author's Affiliation |
() |
17th Author's Name |
|
17th Author's Affiliation |
() |
18th Author's Name |
|
18th Author's Affiliation |
() |
19th Author's Name |
|
19th Author's Affiliation |
() |
20th Author's Name |
|
20th Author's Affiliation |
() |
Speaker |
Author-1 |
Date Time |
2022-06-21 17:20:00 |
Presentation Time |
20 minutes |
Registration for |
SDM |
Paper # |
SDM2022-31 |
Volume (vol) |
vol.122 |
Number (no) |
no.84 |
Page |
pp.27-30 |
#Pages |
4 |
Date of Issue |
2022-06-14 (SDM) |
|