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Paper Abstract and Keywords
Presentation 2022-12-08 14:10
Measurement of work function of hafnium nitride thin films prepared by dc and rf magnetron sputtering
Tomoaki Osumi (Kyoto Univ.), Masayoshi Nagao (AIST), Yasuhito Gotoh (Kyoto Univ.) ED2022-53
Abstract (in Japanese) (See Japanese page) 
(in English) Hafnium nitride(HfN) thin films were prepared by dc and rf magnetron sputtering. The nitrogen compositions of HfN thin films were controlled by N2 flow ratio during deposition. Nitrogen compositions of HfN thin films were evaluated by non-Rutherford backscattering spectrometry with a 1.6 MeV proton beam. Work functions of the films were evaluated by Kelvin probe in air. The relationships between nitrogen compositions and work functions of the films prepared by different methods were compared. The work functions of HfN thin films increased as nitrogen compositions increased in the range of N/Hf of 0.9-1.1 for both methods.
Keyword (in Japanese) (See Japanese page) 
(in English) Hafnium nitride / Work function / Nitrogen composition / Reactive sputtering / / / /  
Reference Info. IEICE Tech. Rep., vol. 122, no. 298, ED2022-53, pp. 15-17, Dec. 2022.
Paper # ED2022-53 
Date of Issue 2022-12-01 (ED) 
ISSN Online edition: ISSN 2432-6380
Copyright
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee ED  
Conference Date 2022-12-08 - 2022-12-09 
Place (in Japanese) (See Japanese page) 
Place (in English) 12/8 Nagoya University, 12/9 WINC AICHI 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Applications of electron and ion beam 
Paper Information
Registration To ED 
Conference Code 2022-12-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Measurement of work function of hafnium nitride thin films prepared by dc and rf magnetron sputtering 
Sub Title (in English)  
Keyword(1) Hafnium nitride  
Keyword(2) Work function  
Keyword(3) Nitrogen composition  
Keyword(4) Reactive sputtering  
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1st Author's Name Tomoaki Osumi  
1st Author's Affiliation Kyoto University (Kyoto Univ.)
2nd Author's Name Masayoshi Nagao  
2nd Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
3rd Author's Name Yasuhito Gotoh  
3rd Author's Affiliation Kyoto University (Kyoto Univ.)
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Speaker Author-1 
Date Time 2022-12-08 14:10:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2022-53 
Volume (vol) vol.122 
Number (no) no.298 
Page pp.15-17 
#Pages
Date of Issue 2022-12-01 (ED) 


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