Paper Abstract and Keywords |
Presentation |
2022-12-08 14:10
Measurement of work function of hafnium nitride thin films prepared by dc and rf magnetron sputtering Tomoaki Osumi (Kyoto Univ.), Masayoshi Nagao (AIST), Yasuhito Gotoh (Kyoto Univ.) ED2022-53 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Hafnium nitride(HfN) thin films were prepared by dc and rf magnetron sputtering. The nitrogen compositions of HfN thin films were controlled by N2 flow ratio during deposition. Nitrogen compositions of HfN thin films were evaluated by non-Rutherford backscattering spectrometry with a 1.6 MeV proton beam. Work functions of the films were evaluated by Kelvin probe in air. The relationships between nitrogen compositions and work functions of the films prepared by different methods were compared. The work functions of HfN thin films increased as nitrogen compositions increased in the range of N/Hf of 0.9-1.1 for both methods. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Hafnium nitride / Work function / Nitrogen composition / Reactive sputtering / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 122, no. 298, ED2022-53, pp. 15-17, Dec. 2022. |
Paper # |
ED2022-53 |
Date of Issue |
2022-12-01 (ED) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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ED2022-53 |
Conference Information |
Committee |
ED |
Conference Date |
2022-12-08 - 2022-12-09 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
12/8 Nagoya University, 12/9 WINC AICHI |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Applications of electron and ion beam |
Paper Information |
Registration To |
ED |
Conference Code |
2022-12-ED |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Measurement of work function of hafnium nitride thin films prepared by dc and rf magnetron sputtering |
Sub Title (in English) |
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Keyword(1) |
Hafnium nitride |
Keyword(2) |
Work function |
Keyword(3) |
Nitrogen composition |
Keyword(4) |
Reactive sputtering |
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1st Author's Name |
Tomoaki Osumi |
1st Author's Affiliation |
Kyoto University (Kyoto Univ.) |
2nd Author's Name |
Masayoshi Nagao |
2nd Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
3rd Author's Name |
Yasuhito Gotoh |
3rd Author's Affiliation |
Kyoto University (Kyoto Univ.) |
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Speaker |
Author-1 |
Date Time |
2022-12-08 14:10:00 |
Presentation Time |
25 minutes |
Registration for |
ED |
Paper # |
ED2022-53 |
Volume (vol) |
vol.122 |
Number (no) |
no.298 |
Page |
pp.15-17 |
#Pages |
3 |
Date of Issue |
2022-12-01 (ED) |