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Paper Abstract and Keywords
Presentation 2023-05-19 15:40
Fabrication and evaluation of transfer-free graphene FETs on sapphire substrates using agglomeration phenomenon of Ni patterns with ultra-fine structure
Ichiro Kato, Toshiharu Kubo, Makoto Miyoshi, Takashi Egawa (Nagoya Inst. of Tech.) ED2023-5 CPM2023-5 SDM2023-22
Abstract (in Japanese) (See Japanese page) 
(in English) Using graphene as a FET requires transferring it to an insulating substrate, and defects may be introduced in the graphene in the process. We report that transfer-free graphene can be formed on insulating substrates by using a metal catalyst aggregation technique. In previous studies, we fabricated FETs with transfer-free graphene and observed drain current modulations by applied gate voltages. Furthermore, we confirmed that graphene deposition and device pattern formation can proceed simultaneously by controlling metal aggregation using pre-formed metal Ni patterns, and that several layers of graphene are formed in the vicinity of metal Ni patterns. In this study, we attempted to form Ni patterns with submicron spacing by EB lithography and substrate-heated Ni deposition, and FETs using transfer-free graphene were fabricated. We could confirm the drain current modulations by applied gate voltages.
Keyword (in Japanese) (See Japanese page) 
(in English) Graphene / FET / The metal agglomeration technique / / / / /  
Reference Info. IEICE Tech. Rep., vol. 123, no. 41, ED2023-5, pp. 20-23, May 2023.
Paper # ED2023-5 
Date of Issue 2023-05-12 (ED, CPM, SDM) 
ISSN Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2023-5 CPM2023-5 SDM2023-22

Conference Information
Committee CPM ED SDM  
Conference Date 2023-05-19 - 2023-05-19 
Place (in Japanese) (See Japanese page) 
Place (in English) Nagoya Institute of Technology 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To ED 
Conference Code 2023-05-CPM-ED-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication and evaluation of transfer-free graphene FETs on sapphire substrates using agglomeration phenomenon of Ni patterns with ultra-fine structure 
Sub Title (in English)  
Keyword(1) Graphene  
Keyword(2) FET  
Keyword(3) The metal agglomeration technique  
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1st Author's Name Ichiro Kato  
1st Author's Affiliation Nagoya Institute of Technology (Nagoya Inst. of Tech.)
2nd Author's Name Toshiharu Kubo  
2nd Author's Affiliation Nagoya Institute of Technology (Nagoya Inst. of Tech.)
3rd Author's Name Makoto Miyoshi  
3rd Author's Affiliation Nagoya Institute of Technology (Nagoya Inst. of Tech.)
4th Author's Name Takashi Egawa  
4th Author's Affiliation Nagoya Institute of Technology (Nagoya Inst. of Tech.)
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Speaker Author-1 
Date Time 2023-05-19 15:40:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2023-5, CPM2023-5, SDM2023-22 
Volume (vol) vol.123 
Number (no) no.41(ED), no.42(CPM), no.43(SDM) 
Page pp.20-23 
#Pages
Date of Issue 2023-05-12 (ED, CPM, SDM) 


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