Fri, Oct 13 PM 13:00 - 17:20 |
(1) |
13:00-13:40 |
[Invited Talk]
Defect Reduction in UV Nanoimprint Lithography |
Toshiki ITO (Canon) |
(2) |
13:40-14:20 |
[Invited Talk (Young Researcher)]
Investigation on Thermoelectric Properties of Flexible Thermoelectric Power Generators from Conductive Fabrics |
Hudzaifah Al Hijri, Daiki Kansaku, Hiroya Ikeda (Shizuoka Univ.) |
|
14:20-14:30 |
Break ( 10 min. ) |
(3) |
14:30-15:10 |
[Invited Talk]
Determination of charge centroid location and energy depth of charge carriers trapped in silicon nitride charge-trap layers |
Kiyoteru Kobayashi (Tokai Univ.) |
(4) |
15:10-15:50 |
[Invited Talk]
statistical analysis of random telegraphic noise dependence on operating condition using electrical characteristic measurement platform |
Takezo Mawaki, Rihito Kuroda (Tohoku Univ.) |
|
15:50-16:00 |
Break ( 10 min. ) |
(5) |
16:00-16:20 |
Excimer laser annealing method with the controlled grain size of poly-Si films and TFT characteristics |
Shu Nishida, Keita Katayama, Daisuke Nakamura (Kyushu Univ.), Tetsuya Goto (Tohoku Univ.), Hiroshi Ikenoue (Kochi Univ. of Technology) |
(6) |
16:20-16:40 |
Formation and basic evaluation of gallium oxide thin film on sapphire substrate |
Fuminobu Imaizumi, Takumi Morita (NIT, Oyama college) |
(7) |
16:40-17:00 |
Formation process of GaN MOS interface suppressing interfacial oxidation |
Tsurugi Kondo, Katsunori Ueno, Ryo Tanaka, Shinya Takashima, Masaharu Edo (Fuji Electric), Tomoyuki Suwa (NICHe, Tohoku Univ.) |
(8) |
17:00-17:20 |
A study on the integration process of ReRAM and OFET utilizing Nitrogen doped LaB6/LaBxNy stacked structure |
Jiaang Zhao, Shun-ichiro Ohmi (Tokyo Tech) |