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Chair |
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Tatsuya Kunikiyo (Renesas) |
Vice Chair |
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Takahiro Shinada (Tohoku Univ.) |
Secretary |
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Rihito Kuroda (Tohoku Univ.), Tadashi Yamaguchi (Renesas) |
Assistant |
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Hiroya Ikeda (Shizuoka Univ.) |
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Conference Date |
Wed, Oct 26, 2016 14:00 - 16:50
Thu, Oct 27, 2016 10:00 - 14:40 |
Topics |
Process Science and New Process Technology |
Conference Place |
Niche, Tohoku Univ. |
Address |
6-6-10, Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan |
Contact Person |
Rihito Kuroda, Tohoku University |
Wed, Oct 26 PM 14:00 - 16:50 |
(1) |
14:00-14:50 |
[Invited Talk]
Controlling Metallic Contamination in Advanced ULSI Processing |
Koichiro Saga (Sony) |
(2) |
14:50-15:15 |
Formation technology of Flat Surface after Selective Epitaxial Growth on Ion-Implanted (100) Oriented Thin SOI Wafers |
Kiichi Furukawa, Akinobu Teramoto, Rihito Kuroda, Tomoyuki Suwa, Keiichi Hashimoto, Shigetoshi Sugawa (Tohoku Univ.), Daisuke Suzuki, Yoichiro Chiba, Katsutoshi Ishii, Akira Shimizu, Kazuhide Hasebe (Tokyo Electron Tohoku) |
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15:15-15:30 |
Break ( 15 min. ) |
(3) |
15:30-16:10 |
[Invited Talk]
Back-Bias Control Technique for Suppression of Die-to-Die Delay Variability of SOTB CMOS Circuits at Ultralow-Voltage (0.4 V) Operation |
Hideki Makiyama, Yoshiki Yamamoto, Takumi Hasegawa, Shinobu Okanishi, Keiichi Maekawa, Hiroki Shinkawata, Shiro Kamohara, Yasuo Yamaguchi (Renesas Electronics Corp.), Nobuyuki Sugii (Hitach), Koichiro Ishibashi (The Univ. of Electro-Communications), Tomoko Mizutani, Toshiro Hiramoto (The Univ. of Tokyo) |
(4) |
16:10-16:50 |
[Invited Talk]
Ultralow-Voltage Operation of Silicon-on-Thin-BOX (SOTB) 2Mbit SRAM Down to 0.37 V Utilizing Adaptive Back Bias |
Yoshiki Yamamoto, Hideki Makiyama, Takumi Hasegawa, Shinobu Okanishi, Keiichi Maekawa, Shinkawata Hiroki, Shiro Kamohara, Yasuo Yamaguchi (Renesas), Nobuyuki Sugii (Hitachi), Tomoko Mizutani, Toshiro Hiramoro (UT) |
Wed, Oct 26 PM 16:50 - 16:50 |
Thu, Oct 27 AM 10:00 - 14:40 |
(5) |
10:00-10:25 |
Effects of the oxidizing species on the interface of Al2O3 film by atomic layer deposition |
Masaya Saito, Tomoyuki Suwa, Akinobu Teramoto, Rihito Kuroda, Yasumasa Koda, Hisaya Sugita, Hidekazu Ishii, Yoshinobu Shiba, Yasuyuki Shirai, Shigetoshi Sugawa (Tohoku univ.), Marie Hayashi, Junichi Tsuchimoto (CANON ANELVA) |
(6) |
10:25-10:50 |
A Study on Pentacene Film Formation on SiO2 with Wet Process for Bottom-Contact Type OFETs |
Yasutaka Maeda, Mizuha Hiroki, Shun-ichiro Ohmi (Tokyo Tech.) |
(7) |
10:50-11:15 |
Behavior of Random Telegraph Noise toward Bias Voltage Changing |
Takezo Mawaki, Akinobu Teramoto, Rihito Kuroda, Shinya Ichino, Tetsuya Goto, Tomoyuki Suwa, Shigetoshi Sugawa (Tohoku Univ.) |
(8) |
11:15-11:40 |
Effect of Si surface flatness on electrical characteristics of Hf-based MONOS structure |
Sohya Kudoh, Shun-ichiro Ohmi (Tokyo Tech) |
|
11:40-13:00 |
Lunch ( 80 min. ) |
(9) |
13:00-13:50 |
[Invited Talk]
Novel Pixel Structure with Stacked Deep Photodiode to Achieve High NIR Sensitivity and High MTF |
Hiroki Takahashi, Hiroshi Tanaka, Masahiro Oda, Mitsuyoshi Ando, Naoto Niisoe (TPSCo), Shinichi Kawai, Takuya Asano, Mitsugu Yoshita, Tohru Yamada (PSCS) |
(10) |
13:50-14:40 |
[Invited Talk]
Low-Noise Imaging Techniques for Scientific CMOS Image Sensors |
Min-Woong Seo, Shoji Kawahito (Shizuoka Univ.) |
Announcement for Speakers |
General Talk | Each speech will have 20 minutes for presentation and 5 minutes for discussion. |
Contact Address and Latest Schedule Information |
SDM |
Technical Committee on Silicon Device and Materials (SDM) [Latest Schedule]
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Contact Address |
Rihito Kuroda(Tohoku Univ.)
Tel 022-795-4833 Fax 022-795-4834
E-: e3 |
Last modified: 2016-08-19 13:11:18
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