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Chair |
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Rumiko Yamaguchi (Akita Univ.) |
Vice Chair |
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Masahiro Yamaguchi (Tokyo Inst. of Tech.), Hiroyuki Nitta (Japan Display) |
Secretary |
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Munekazu Date (NTT), Mitsuru Nakata (NHK) |
Assistant |
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Mutsumi Kimura (Ryukoku Univ.), Tomokazu Shiga (Univ. of Electro-Comm.), Takeshi Okuno (Huawei), Hiroko Kominami (Shizuoka Univ.), Masanobu Mizusaki (SHARP), Masayuki Kanbara (NAIST) |
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Chair |
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Takahiro Shinada (Tohoku Univ.) |
Vice Chair |
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Hiroshige Hirano (TowerJazz Panasonic) |
Secretary |
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Hiroya Ikeda (Shizuoka Univ.), Tetsu Morooka (KIOXIA) |
Assistant |
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Takahiro Mori (AIST), Nobuaki Kobayashi (Nihon Univ.) |
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Conference Date |
Tue, Dec 24, 2019 13:00 - 17:00 |
Topics |
Semiconductor Material Process and Device Meeting |
Conference Place |
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Sponsors |
This conference is co-sponsored by The Japan Society of Applied Physics.
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Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Registration Fee |
This workshop will be held as the IEICE workshop in fully electronic publishing. Registration fee will be necessary except the speakers and participants other than the participants to workshop(s) in non-electronic publishing. See the registration fee page. We request the registration fee or presentation fee to participants who will attend the workshop(s) on SDM, EID. |
Tue, Dec 24 PM 13:00 - 17:00 |
(1) |
13:00-13:25 |
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(2) SDM |
13:25-13:45 |
Evaluate interface charges and bulk oxide charges on SiO2/GaN MOS structure before and after post-metallization annealing EID2019-5 SDM2019-80 |
Masaaki Furukawa, Mutsunori Uenuma, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST) |
(3) ITE-IDY |
13:45-14:05 |
Development of memristor using Ga-Sn-O thin film by mist CVD method |
Masaki Kobayashi, Sumio Sugisaki, Mutsumi Kimura (Ryukoku Univ.) |
(4) ITE-IDY |
14:05-14:25 |
Ga-Sn-O TFT fabricated on Al2O3 insulating film |
Kazuki Hattori, Kenta Tanino, Tokiyoshi Matsuda, Mutsumi Kimura (Ryukoku Univ), Toshiyuki Kawaharamura (Kochi Univ of Tech) |
(5) SDM |
14:25-14:45 |
Construction of CuInS2 nanoparticles through a bio-templated precursor by the cage-shaped protein for quantum devices EID2019-6 SDM2019-81 |
Yuma Karaki, Ryoko Miyanaga, Naofumi Okamoto, Yasuaki Ishikawa (NAIST), Ichiro Yamashita (Osaka Univ.), Yukiharu Uraoka (NAIST) |
(6) ITE-IDY |
14:45-15:05 |
In-vitro experiments of artificial retina using thin film device |
Kohei Toyoda, Keisuke Tomioka, Keigo Misawa, Naoya Naitou, Mutsumi Kimura (Ryukoku Univ) |
(7) ITE-IDY |
15:05-15:25 |
Synapse Element for Neural Network based on Multilayer Cross-Point |
Takumi Tsuno, Atsushi Kondo, Jumpei Shimura, Ryo Tanaka, Daiki Yamakawa, Yuki Shibayama, Etsuko Iwagi, Mutsumi Kimura (Ryukoku Univ) |
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15:25-15:35 |
Break ( 10 min. ) |
(8) |
15:35-16:00 |
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(9) SDM |
16:00-16:20 |
Stable Growth of (100)-Oriented Low Angle Grain Boundary Silicon Thin Films Extending to the length of 3000 μm by a Continuous-Wave Laser Lateral Crystallization |
Muhammad Arif Razali, Nobuo Sasaki, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST) |
(10) ITE-IDY |
16:20-16:40 |
Crystal growth of (Bi, La) 4Ti3O12 thin film using a two-step deposition process |
Homare Yoshida, Yuma Ishisaki, Yuta Miyabe, Mutsumi Kimura (Ryukoku Univ.) |
(11) ITE-IDY |
16:40-17:00 |
Electrode dependence of memristor characteristic on Resistive Random Access Memory using Ga-Sn-O thin film |
Kaito Hashimoto, Ayata Kurasaki, Ryo Tanaka, Sumio Sugisaki, Ryo Sumida, Mutsumi Kimura (Ryukoku Univ.) |
Announcement for Speakers |
General Talk | Each speech will have 15 minutes for presentation and 5 minutes for discussion. |
Contact Address and Latest Schedule Information |
EID |
Technical Committee on Electronic Information Displays (EID) [Latest Schedule]
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Contact Address |
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SDM |
Technical Committee on Silicon Device and Materials (SDM) [Latest Schedule]
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Contact Address |
Tetsu Morooka(KIOXIA Corp.)
Tel 059-390-7451 Fax 059-361-2739
E-: oxia |
ITE-IDY |
Technical Group on Information Display (ITE-IDY) [Latest Schedule]
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Contact Address |
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Last modified: 2019-11-13 10:20:35
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