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| Chair |
|
Kiyoshi Ishii |
| Vice Chair |
|
Kiichi Kamimura |
| Secretary |
|
Toru Matsuura, Seiji Toyoda |
| Assistant |
|
Hidehiko Shimizu, Yasushi Takemura |
|
| Conference Date |
Thu, Nov 9, 2006 13:30 - 17:25
Fri, Nov 10, 2006 09:00 - 12:05 |
| Topics |
Process of Thin Film formation and Materials, etc. |
| Conference Place |
Kakuma Campus, Kanazawa University |
| Address |
Kakuma-machi, Kanazawa, Ishikawa, 920-1192 Japan |
| Transportation Guide |
http://www.ad.kanazawa-u.ac.jp/exchange/location/ |
Contact
Person |
Prof. Akiharu Morimoto
076-234-4876 |
Thu, Nov 9 PM
13:30 - 17:25 |
| (1) |
13:30-13:55 |
Prepration of AZO thin films by sputtering method |
Ayumu Kawakami, Toru Noguchi, Akiyuki Higashide, Shinsuke Miyazaki, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano, Takahiro Kawakami (Niigata Univ.), Yoichi Hoshi (T.P.U.) |
| (2) |
13:55-14:20 |
Prepration of ITO thin films on plastic substrate. |
Masaki Takeuchi, Kazuya Morishita, Takeshi Umetsu, Yusuke Nakata, Shinsuke Miyazaki, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano, Takahiro Kawakami (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnics Univ.), Masahiro Minagawa (Nippon Seiki) |
| (3) |
14:20-14:45 |
Fabrication of Cr2O3 Thin Films by RF Magnetron Sputtering |
Takeshi Asada, Kenjirou Nagase, Takayuki Yamada, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon univ) |
| (4) |
14:45-15:10 |
Growth Control of Carbon Nanotubes on Ni/Mo Bilayer |
Hiroki Okuyama, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.) |
| |
15:10-15:20 |
Break ( 10 min. ) |
| (5) |
15:20-15:45 |
Cathodo-Luminescence study of AlInN films grown by RF-MBE |
Yu Mimura, Wataru Terashima, Song-Bek Che, Yoshihiro Ishitani, Akihiko Yoshikawa (Chiba Univ.) |
| (6) |
15:45-16:10 |
Reactive Sputter Deposition of AlN Film and Its Application to LD Submount |
Akihiro Shiono, Masahide Nakakuki, Isao Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe (Shinshu Univ.), Motoki Obata (CITIZEN FINE TECH), Katsuya Abe, Kiichi Kamimura (Shinshu Univ.) |
| (7) |
16:10-16:35 |
Thermal stability and interface moｒphology in Cu/ZrN/SiOC/Si system |
Atsushi Noya, Masaru Sato, Mayumi B. Takeyama (Kitami Inst. of Technol.), Eiji Aoyagi (Tohoku Univ.) |
| (8) |
16:35-17:00 |
Novel PVD process of extremely-thin TiNx barrier with radical reaction for Cu interconnects |
Mayumi B. Takeyama, Tadayoshi Yanagita, Atsushi Noya (Kitami Inst. of Technol.) |
| (9) |
17:00-17:25 |
Barrier properties of HfNx thin films prepared by hot wire method between Cu interconnects and SiO2 or SiOC layer |
Masaru Sato, Mayumi B. Takeyama, Atsushi Noya (Kitami Inst. of Technol.) |
Fri, Nov 10 AM
09:00 - 12:05 |
| (10) |
09:00-09:25 |
Surface roughness control of SiGe layer deposited by Ion Beam Sputtering toward strained Si fabrication |
Jun Yamamoto, Yuta Sakaguchi, Kimihiro Naruse, Kimihiro Sasaki (Kanazawa Univ.) |
| (11) |
09:25-09:50 |
Thermoelectric performance of deteriorated SiGe thin films
-- influence from substrate -- |
Akinari Matoba, Toshio Hayahira, Takahiro Tsuduki, Kimihiro Sasaki (Kanazawa Univ.), Youich Okamoto, Jun Morimoto (Defense Univ.) |
| (12) |
09:50-10:15 |
Formation of high density nanodots aiming for Ge embedded SiC |
Tetsushi Kanemaru, Tomoaki Ogiwara, Kanji Yasui, Tadashi Akahane, Masasuke Takata (Nagaoka Univ. Tech.) |
| (13) |
10:15-10:40 |
Degradation of MOVPE InN during the growth |
Kenichi Sugita, Yoshinori Hochin, Akihiro Hashimoto, Akio Yamamoto (Univ. of Fukui) |
| |
10:40-10:50 |
Break ( 10 min. ) |
| (14) |
10:50-11:15 |
Growth delay time on fabricating thin ZrO2 film by limited reaction sputtering |
Hidetaka Sugiyama, Nobuo Kojima, Taro Yamagishi, Zhou Ying, Kimihiro Sasaki (Kanazawa Univ.) |
| (15) |
11:15-11:40 |
The practical sputtering system for oxide films by oxygen ion implantation |
Shinobu Chiba, Kimihiro Sasaki (Kanazawa Univ.), Akira Motoki (CBC Co.,Ltd), Tomonobu Hata (JST), Akihiko Ito (SHIBAURA MECHATRONICS Corp.) |
| (16) |
11:40-12:05 |
Effect of Surface Roughness of Substrate on Structure and Temperature Coefficient of Resistance (TCR) of NiCr Films Deposited by Sputtering |
Satoshi Iwatsubo, Takaaki Shimizu (Toyama Ind. Tech. Ctr.) |
| Announcement for Speakers |
| General Talk (25) | Each speech will have 20 minutes for presentation and 5 minutes for discussion. |
| Contact Address and Latest Schedule Information |
| CPM |
Technical Committee on Component Parts and Materials (CPM) [Latest Schedule]
|
| Contact Address |
Hidehiko Shimizu（Niigata University）
TEL 025-262-6811, FAX 025-262-6811
E- :     eng  i  -u
Akiharu Morimoto (Kanazawa University)
TEL 076-234-4876, FAX 076-234-4870
E-: a  tect    -u
Kanji Yasui（Nagaoka Univ. of Technol.）
TEL 0258-47-9502 FAX 0258-47-9500
E-: k  ivos ut |
Last modified: 2006-10-30 21:12:26
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