IEICE Technical Committee Submission System
Advance Program
Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top  Go Back   / [HTML] / [HTML(simple)] / [TEXT]  [Japanese] / [English] 

===============================================
Technical Committee on Electron Device (ED)
Chair: Tamotsu Hashidume (Hokkaido Univ.) Vice Chair: Toru Kaji (Toyota Central R&D Labs.)
Secretary: Koichi Murata (NTT), Naoki Hara (Fujitsu Labs.)
Assistant: Kunio Tsuda (Toshiba), Michihiko Suhara (Tokyo Metropolitan Univ.)

===============================================
Technical Committee on Silicon Device and Materials (SDM)
Chair: Shigeyoshi Watanabe (Shonan Inst. of Tech.) Vice Chair: Toshihiro Sugii (Fujitsu Microelectronics)
Secretary: Hisahiro Anzai (Sony), Tetsuro Endo (Tohoku Univ.)
Assistant: Katsunori Onishi (Kyushu Inst. of Tech.), Yukinori Ono (NTT)

DATE:
Mon, Feb 22, 2010 13:00 - 16:55
Tue, Feb 23, 2010 09:30 - 12:50

PLACE:
Okinawa-ken Seinenn-Kaikan(2-15-23 Kume, Naha-shi, 900-0033 Japan.http://www.okinawakenseinenkaikan.or.jp/new/page.php?7. Prof. Takashi Noguchi. +81-98-864-1780)

TOPICS:
Functional Nano Device and Related Technology

----------------------------------------
Mon, Feb 22 PM (13:00 - 14:40)
----------------------------------------

(1) 13:00 - 13:25
Neuromorphic adiabatic quantum computation based on phosphorus nuclear spin array in Si
Mitsunaga Kinjo (Univ. of the Ryukyus), Shigeo Sato (Tohoku Univ.)

(2) 13:25 - 13:50
Seebeck coefficient in heavily-doped SOI layers
Hiroya Ikeda, Faiz Salleh (Shizuoka Univ.)

(3) 13:50 - 14:15
Stochastic Resonance Devices Based on Carbon Nanotube Field-Effect Transistors
Yasufumi Hakamata, Yasuhide Ohno, Kenzo Maehashi (ISIR Osaka Univ.), Seiya Kasai (RCIQE Hokkaido Univ.), Koichi Inoue, Kazuhiko Matsumoto (ISIR Osaka Univ.)

(4) 14:15 - 14:40
Analysis on Stochastic Resonance Behavior of Single Electron in Quantum Dots
Seiya Kasai (Hokkaido Univ/JST), Yuta Shiratori, Kensuke Miura (Hokkaido Univ.)

----- Break ( 10 min. ) -----

----------------------------------------
Mon, Feb 22 PM (14:50 - 16:55)
----------------------------------------

(5) 14:50 - 15:15
MOVPE Growth of InGaN/GaN MQW on a Polar, Semi-polar, and Non-polar GaN Stripes by Selective MOVPE
Tomoyuki Tanikawa, Yoshio Honda, Masahito Yamaguchi (Nagoya Univ.)

(6) 15:15 - 15:40
Formation of Si Nanocrystals in SiOx Films Induced by Thermal Plasma Jet Millisecond Annealing and Its Application to Floating Gate Memory
Tatsuya Okada (Univ. of the Ryukyus), Seiichiro Higashi, Katsunori Makihara, Yasuo Hiroshige, Seiichi Miyazaki (Hiroshima Univ.)

(7) 15:40 - 16:05
Integration of Single-Electron Transistors Using Field-Emission-Induced Electromigration
Shunsuke Ueno, Yusuke Tomoda, Watari Kume, Michinobu Hanada, Kazutoshi Takiya, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech.)

(8) 16:05 - 16:30
Fabrication of Planar-Type Ferromagnetic Tunnel Junctions Using Field-Emission-Induced Electromigration
Kazutoshi Takiya, Yusuke Tomoda, Takato Watanabe, Watari Kume, Shunsuke Ueno, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech)

(9) 16:30 - 16:55
Observation of enhanced MR effects in a single electron transistor with ferromagnetic lead electrodes
Nobuyuki Tamura, Kento Kikuchi, Masataka Moriya, Tadayuki Kobayashi, Hiroshi Shimada, Yoshinao Mizugaki (Univ. of Electro-Comm.)

----------------------------------------
Tue, Feb 23 AM (09:30 - 11:25)
----------------------------------------

(10) 09:30 - 10:10
[Invited Talk]
Effect of interface properties on characteristics of carbon nanotube FETs
Yutaka Ohno, Naoki Moriyama, Takamitsu Kitamura, Kosuke Suzuki, Shigeru Kishimoto, Takashi Mizutani (Nagoya Univ.)

(11) 10:10 - 10:35
CMOS inverters based on carbon nanotube field-effect transistors with SiNx passivation films
Takaomi Kishimoto, Yasuhide Ohno, Kenzo Maehashi, Koichi Inoue, Kazuhiko Matsumoto (ISIR, Osaka Univ.)

(12) 10:35 - 11:00
Fabrication of nanowire-based sequential circuits using gate-controlled GaAs three-branch nanowire junctions
Hiromu Shibata, Daisuke Nakata, Yuta Shiratori (Hokkaido Univ), Seiya Kasai (Hokkaido Univ/JST)

(13) 11:00 - 11:25
Compact Reconfigurable BDD Logic Circuits utilizing GaAs Nanowire Network
Yuta Shiratori, Kensuke Miura (Hokkaido Univ.), Seiya Kasai (Hokkaido Univ./JST)

----- Break ( 10 min. ) -----

----------------------------------------
Tue, Feb 23 AM (11:35 - 12:50)
----------------------------------------

(14) 11:35 - 12:00
Detectors of Terahertz and Infrared Radiation Based on p-i-n Single- and Multiple Graphene Layer Structures
Victor Ryzhii, Maxim Ryzhii (Univ. of Aizu), Taiichi Otsuji (Tohoku Univ.), Vladimir Mitin (Buffalo Univ.)

(15) 12:00 - 12:25
Electrical Property of CNT/cellulose Composite Paper
Tomo Tanaka, Eiichi Sano (Hokkaido Univ.), Kousuke Akiyama, Masanori Imai (Tokushu Paper)

(16) 12:25 - 12:50
Nonvolatile memory based on carbon nanotube field-effect transistors
Kenzo Maehashi, Takahiro Ohori, Satoshi Nagaso, Koichi Inoue, Kazuhiko Matsumoto (Osaka Univ.)

# Information for speakers
General Talk will have 20 minutes for presentation and 5 minutes for discussion.
Invited Talk will have 35 minutes for presentation and 5 minutes for discussion.


=== Technical Committee on Electron Device (ED) ===
# FUTURE SCHEDULE:

Thu, Apr 22, 2010 - Fri, Apr 23, 2010: [Wed, Feb 17]
Thu, May 13, 2010 - Fri, May 14, 2010: Shizuoka University (Hamamatsu Campus) [Wed, Mar 24], Topics: Crystal growth, evaluation and device (Compound, Si, SiGe, Electronic and light emitting materials)

# SECRETARY:
Koichi Murata(NTT)
TEL:+81-46-240-2871、FAX:+81-46-270-2872
E-mail: aecl
Hara Naoki (Fujitsu Lab.)
TEL : +81-46-250-8242、FAX : +81-46-250-8168
E-mail : o
Kunio Tsuda(Toshiba)
TEL : +81-44-549-2142、FAX : +81-44-520-1501
E-mail : oba
Michihiko Suhara (Tokyo Metropolitan Univ.)
TEL : +81-42-677-2765 Fax : +81-42-677-2756
E-mail : t

=== Technical Committee on Silicon Device and Materials (SDM) ===
# FUTURE SCHEDULE:

Fri, Apr 23, 2010: Okinawa-Ken-Seinen-Kaikan Bldg. [Fri, Feb 26], Topics: Advanced Thin-Film Devices (Si, Compound, Organic) and Related Topics
Thu, May 13, 2010 - Fri, May 14, 2010: Shizuoka University (Hamamatsu Campus) [Wed, Mar 24], Topics: Crystal growth, evaluation and device (Compound, Si, SiGe, Electronic and light emitting materials)

# SECRETARY:
Hisahiro Ansai(Sony)
Tel 046-201-3297 Fax046-202-6572
E-mail: HiAniny


Last modified: 2009-12-15 12:55:22


Notification: Mail addresses are partially hidden against SPAM.

[Download Paper's Information (in Japanese)] <-- Press download button after click here.
 
[Cover and Index of IEICE Technical Report by Issue]
 

[Presentation and Participation FAQ] (in Japanese)
 

[Return to ED Schedule Page]   /   [Return to SDM Schedule Page]   /  
 
 Go Top  Go Back   / [HTML] / [HTML(simple)] / [TEXT]  [Japanese] / [English] 


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan