IEICE Technical Committee Submission System
Advance Program
Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top  Go Back   Prev CPM Conf / Next CPM Conf [HTML] / [HTML(simple)] / [TEXT]  [Japanese] / [English] 


Technical Committee on Component Parts and Materials (CPM) [schedule] [select]
Chair Kanji Yasui (Nagaoka Univ. of Tech.)
Vice Chair Yasushi Takemura (Yokohama National Univ.)
Secretary Tadayuki Imai (NTT), Satoru Noge (Numazu National College of Tech.)
Assistant Toshishige Shimamura (NTT), Katsuya Abe (Shinshu Univ.)

Conference Date Thu, Oct 28, 2010 13:00 - 17:55
Fri, Oct 29, 2010 09:00 - 13:05
Topics  
Conference Place Faculty of Engineering, Shinshu University 
Contact
Person
Kiichi Kamimura
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)

Thu, Oct 28 PM 
13:00 - 17:55
(1) 13:00-13:25 Characteristic of Potassium niobate/Barium titanate composites CPM2010-91 Ryousuke Usui, Noriko Bamba (Shinshu Univ.)
(2) 13:25-13:50 Growth of potassium tantalate single crystal by the directional solidification method CPM2010-92 Takayuki Takenaka, Noriko Bamba, Keigo Hoshikawa (Shinshu Univ.)
(3) 13:50-14:15 Structure and magnetic properties of SBA-15 with magnetic metal CPM2010-93 Yoshihiro Shinohara, Tetsuji Haeiwa (Shinshu Univ.)
(4) 14:15-14:40 Magnetic properties of TbFeCo films with Au underlayer for perpendicular magnetic recording CPM2010-94 Songtian Li, Xiaoxi Liu, Akimitsu Morisako (Shinshu Univ.)
  14:40-14:50 Break ( 10 min. )
(5) 14:50-15:15 Preparation of ZnO Nanowires by Ultrasonic Spray Pyrolysis
-- Effect of Solvent on Crystal Morphology --
CPM2010-95
Myo Than Htay, Hiroshi Yasumatsu, Takanori Tanaka, Yoshio Hashimoto (Shinshu Univ.)
(6) 15:15-15:40 Characterization of CuMO2 films grown by reactive sputtering Tsubasa Ogawa, Takuya Yokomoto, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.)
(7) 15:40-16:05 Fabrication and Evaluation C2O3/(Cr1-xAlx)2O3 Layered Thin Film Yutaka Yonebayashi, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.)
(8) 16:05-16:30 Preparation of CaFeOx and SrFeOx thin films on SrTiO3(100) Substrates Kento Norota, Hiroshi Yamamoto, Nobuyuki Iwata, Takuya Nemoto (Nihon Univ)
  16:30-16:40 Break ( 10 min. )
(9) 16:40-17:05 Structure and electric properties of RF-sputtered p-type nickel oxide thin films CPM2010-96 Atsushi Nagata, Kazuo Uchida, Atsushi Koizumi, Hiroshi Ono, Shinji Nozaki (UEC)
(10) 17:05-17:30 Formation of SrAl2O4:Eu, Dy thin films by combined the Unbalanced Magnetron Sputtering and the Facing Target Sputtering Method CPM2010-97 Takashi Kuno, Minoru Saito, Kazuaki Kobayashi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.)
(11) 17:30-17:55 Fluorine-free tungsten deposition by metal-chloride-reduction chemical vapor deposition CPM2010-98 Takehito Watanabe, Akira Shibata, Kensaku Kanomata, Takahiko Suzuki, Fumihiko Hirose (Yamagata Univ.)
Fri, Oct 29 AM 
09:00 - 13:05
(12) 09:00-09:25 Low temperature growth of SiC films by HW-CVD using graphite filaments CPM2010-99 Yuya Sakaguchi, Hironori Nakamura, Jun Arima, Kazuhisa Moriyama, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.)
(13) 09:25-09:50 Estimation of nitride layer thickness and characterization of the interface between SiC and nitride layer prepared by direct nitridation CPM2010-100 Shinichiro Suzuki, Yusuke Murata, Mitsunori Henmi, Tomohiko Yamakami, Rinpei Hayashibe, Kiichi Kamimura (Shinshu Univ.)
(14) 09:50-10:15 Estimation of interface state density at nitride/SiC interface using current-voltage characteristics of MIS Schottky contact CPM2010-101 Yusuke Murata, Shinichiro Suzuki, Shohei Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe, Kiichi Kamimura (Shinshu Univ.)
  10:15-10:25 Break ( 10 min. )
(15) 10:25-10:50 Optimization of GaN film growth condition using pulse-mode hot-mesh CVD CPM2010-102 Kazuki Nagata, Souichi Satomoto (Nagaoka Univ. Technol.), Hironori Katagiri, Kazuo Jimbo (Nagaoka Techni. College), Maki Suemitsu, Tetsuo Endoh, Takashi Ito (Tohoku Univ. Technol.), Hideki Nakazawa (Hirosaki Univ.), Yuzuru Narita (Yamagata Univ.), Kanji Yasui (Nagaoka Univ. Technol.)
(16) 10:50-11:15 Preparation of Cu2ZnSnS4 Thin Film for solar cell
-- Effect of Precursors and Sulfurization conditions --
CPM2010-103
Myo Than Htay, Yasuyoshi Kando, Yoshio Hashimoto (Shinshu Univ.)
(17) 11:15-11:40 Examination of the Mg-Cu Thin Films by Alternate Layer Deposition CPM2010-104 Takeru Shimizu, Toshiro Tannai, Hiroaki Matsui, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami (Niigata Univ.)
  11:40-11:50 Break ( 10 min. )
(18) 11:50-12:15 Examination of ITO Thin Films Deposited at Low-tempurature for OLEDs by Sputtering Method CPM2010-105 Yohei Nakamura, Chang Liu, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.)
(19) 12:15-12:40 Preparation of two layers Organic Thin Film using Alq3/PEDOT by spin coat CPM2010-106 Hina Chujo, Atsushi Noda, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.)
(20) 12:40-13:05 Effects of Deposition Morphology of EL Phosphor on ZnO Nanorods on Characteristics of Lateral DCEL Devices CPM2010-107 Tomomasa Satoh, Yuki Matuzawa, Takaki Kaneshiro, Takashi Hirate (Kanagawa Univ.)

Announcement for Speakers
General TalkEach speech will have 20 minutes for presentation and 5 minutes for discussion.

Contact Address and Latest Schedule Information
CPM Technical Committee on Component Parts and Materials (CPM)   [Latest Schedule]
Contact Address  


Last modified: 2010-08-25 09:00:06


Notification: Mail addresses are partially hidden against SPAM.

[Download Paper's Information (in Japanese)] <-- Press download button after click here.
 
[Cover and Index of IEICE Technical Report by Issue]
 

[Presentation and Participation FAQ] (in Japanese)
 

[Return to CPM Schedule Page]   /  
 
 Go Top  Go Back   Prev CPM Conf / Next CPM Conf [HTML] / [HTML(simple)] / [TEXT]  [Japanese] / [English] 


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan