Wed, Oct 19 AM 09:30 - 10:20 |
|
09:30-10:10 |
( 40 min. ) |
|
10:10-10:20 |
Break ( 10 min. ) |
Wed, Oct 19 AM 10:20 - 17:45 |
(1) |
10:20-11:10 |
[Invited Talk]
Needs for X-ray Optical Elements
-- Expectations for New Process Technology -- |
Wataru Yashiro (Tohoku Univ.) |
(2) |
11:10-11:35 |
Resistance Masurement Technology for Statistical Analysis of Thin Films Materials for Emerging Memory with High Accuracy and Wide Range |
Hidemi Mitsuda, Ryousuke Tenman, Takezou Mawaki, Rihito Kuroda (Tohoku Univ) |
(3) |
11:35-12:00 |
A study on threshold voltage control of MFSFET with ultrathin ferroelectric nondoped HfO2 gate insulator for analog memory applications |
Joong-Won Shin, Masakazu Tanuma, Shun-ichiro Ohmi (Tokyo Tech) |
|
12:00-13:15 |
Lunch Break ( 75 min. ) |
(4) |
13:15-14:05 |
[Invited Talk]
Fabrication of monolayer h-BN/LaB6 heterostructure using thermally aggregation method and its evaluation |
Katsumi Nagaoka, Takashi Aizawa, Shun-ichiro Ohmi (NIMS) |
(5) |
14:05-14:30 |
Evaluation and analysis of ferroelectric BiFeO3 thin film surface |
Fuminobu Imaizumi (NIT, Oyama) |
(6) |
14:30-14:55 |
The effect of microstructures of CrSiC thin film resistors on the electrical properties |
Nozomi Ito, Kazuyoshi Maekawa, Yuji Takahashi, Takashi Tonegawa (Renesas) |
|
14:55-15:15 |
Break ( 20 min. ) |
(7) |
15:15-16:05 |
[Invited Talk]
Fabrication of organic ferroelectric transistors using paper substrates and application to organic solar cells |
Park Byung Eun (University of Seoul), Shun-ichiro Ohmi (TIT) |
(8) |
16:05-16:30 |
A study on low-voltage operation of pentacene-based floating-gate memory utilizing Ar/N2-plasma nitridation with N-doped LaB6 metal and high-k LaBxNy insulator |
Eun-Ki Hong, Shun-ichiro Ohmi (Tokyo Tech.) |
(9) |
16:30-17:20 |
[Invited Talk]
Reliability improvement of SiC MOSFET by high-temperature CO2 annealing |
Takuji Hosoi (Kwansei Gakuin Univ.), Takayoshi Shimura, Heiji Watanabe (Osaka Univ.) |
(10) |
17:20-17:45 |
A study on threshold voltage control of MFSFET utilizing ferroelectric nondoped HfO2 thin films |
Masakazu Tanuma, Joong-Won Shin, Shun-ichiro Ohmi (Tokyo Tech) |
|
17:45-18:15 |
( 30 min. ) |