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Technical Committee on Silicon Device and Materials (SDM) [schedule] [select]
Chair Tanemasa Asano (Kyushu Univ.)
Vice Chair Toshihiro Sugii (Fujitsu)
Secretary Shigeru Kawanaka (Toshiba), Hisahiro Anzai (Sony)
Assistant Syunichiro Ohmi (Tokyo Inst. of Tech.)

Technical Committee on Organic Molecular Electronics (OME) [schedule] [select]
Chair Kazuhiro Kudo (Chiba Univ.)
Secretary Tohru Kubota (NICT), Takaaki Manaka (Tokyo Inst. of Tech.)

Conference Date Fri, Apr 11, 2008 09:00 - 17:00
Sat, Apr 12, 2008 09:00 - 11:50
Topics TFT Materials, Devices, and Applications and Others related to SDM and OME activity 
Conference Place Okinawa Seinen Kaikan 
Address 2-15-23 Kume, Naha, Okinawa, Japan
Transportation Guide 5min on foot from Asahibashi Stn. of Mono-Rail Naha
http://www.okinawakenseinenkaikan.or.jp/
Contact
Person
Prof. Takashi Noguchi
098-864-1780 (会場)
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)

Fri, Apr 11 AM 
09:00 - 17:00
(1) 09:00-09:30 [Invited Talk]
Location control of super lateral growth in excimer laser crystallization of Si film by micro-melt seeding method SDM2008-1 OME2008-1
Wenchang Yeh, Hanseng Dai, Hsinchi Chen, Bingcyun Chen (NTUST)
(2) 09:30-10:00 [Invited Talk]
Study of Application of compressible Flow and Shock Wave to PLA SDM2008-2 OME2008-2
Minoru Yaga, Hiroshi Fukuoka, Hideki Mine (Univ. of the Ryukyus), Toshio Takiya (Hitachi Zosen)
(3) 10:00-10:25 Looking into poly-Si films from TFT characteristics SDM2008-3 OME2008-3 Tadashi Serikawa (Osaka Univ.)
  10:25-10:35 Break ( 10 min. )
(4) 10:35-11:00 Electrical activation of heavily doped Si film by crystallization annealing SDM2008-4 OME2008-4 Takashi Noguchi, Tomoyuki Miyahira, Kenji Kawai (Univ. Ryukyus), Toshiharu Suzuki, Masateru Sato (SEN)
(5) 11:00-11:25 Investigation on Characteristic Variation of Polycrystalline-Si Thin Film Transistor Having Stripe Channels SDM2008-5 OME2008-5 Koji Akiyama, Kazunori Watanabe, Tanemasa Asano (Graduate school, Kyushu Univ.)
(6) 11:25-11:50 Evaluation of stress and crystallinity of laser crystallization polysilicon thin film using UV/Visible Raman spectroscopy SDM2008-6 OME2008-6 Yasuto Kakemura, Daisuke Kosemura, Atsushi Ogura (Meiji Univ.), Takashi Noguchi (Univ. of the Ryukyus)
(7) 11:50-12:15 Application of Si Thin-Film to Photo-Sensor Device SDM2008-7 OME2008-7 Mitsuharu Tai, Yasutaka Konno, Mutsuko Hatano (CRL, Hitachi), Toshio Miyazawa (Hitachi Displays)
  12:15-13:15 Lunch Break ( 60 min. )
(8) 13:15-13:40 Clarification of ITO/AlNiNd contact formation mechanism SDM2008-8 OME2008-8 Kazumasa Kawase, Tsukasa Motoya, Junji Tanimura (Mitsubishi Electric Corp.), Naoki Tsumura (メルコ・ディスプレイ・テクノロジ), Kensuke Nagayama (メルコ・ディスプレイ・テクノロジー), Nobuaki Ishiga (メルコ・ディスプレイ・テクノロジ), Kazunori Inoue (Mitsubishi Electric Corp.)
(9) 13:40-14:05 Preparation and Characterization of Thermal Oxidization Anodized Si with a Low-k Dielectric Constant SDM2008-9 OME2008-9 Tomihiro Sonegawa, Kazuhiro Uehara, Takehiro Maehama (Univ. of the Ryukyus)
(10) 14:05-14:30 Degradation of Ga2o3-In2O3-Zno(GIZO) Thin Film Transistors SDM2008-10 OME2008-10 Mami Fujii, Hiroshi Yano, Tomoaki Hatayama, Yukiharu Uraoka, Takashi Fuyuki (NAIST), Ji Sim Jung, Jang Yeon Kwon (Sumsung Advenced Institute of Technology)
(11) 14:30-14:55 Oxide-channel thin film transistors with ferroelectric and high-k gate insulators SDM2008-11 OME2008-11 Eisuke Tokumitsu, Hiroshi Shibata, Tomohiro Oiwa, Yohei Kondo (Tokyo Tech)
  14:55-15:10 Break ( 15 min. )
(12) 15:10-15:40 [Invited Talk]
Structure and Field-effect Transistor Characteristics of Organic Semiconductors SDM2008-12 OME2008-12
Reiko Azumi, Masayuki Chikamatsu, Yuji Yoshida, Kiyoshi Yase (PRI, AIST)
(13) 15:40-16:10 [Invited Talk]
In situ observation of absorption spectra of proteins on solid/liquid interfaces by using slab optical waveguide spectroscopy
Naoki Matsuda, Yusuke Ayato, Masayoshi Matsui (AIST)
(14) 16:10-16:35 Improvement of Interface Property in Pentacene TFT by Atomic Hydrogen Annealing SDM2008-13 OME2008-13 Akira Heya, Masahiko Sato, Hiroshi Hasegawa, Naoto Matsuo (Univ. of Hyogo)
(15) 16:35-17:00 Device simulation on organic TFT
-- Dependence on structures --
SDM2008-14 OME2008-14
Chang-Hoon Shim, Reiji Hattori, Fumito Maruoka (Kyushu Univ.)
Sat, Apr 12 AM 
09:00 - 11:50
(16) 09:00-09:30 [Invited Talk]
Control of microstructures of Si bulk muticrystals for improvement of solar cell performance SDM2008-15 OME2008-15
Noritaka Usami, Kozo Fujiwara, Kentaro Kutsukake, Kazuo Nakajima (IMR, Tohoku Univ.)
(17) 09:30-10:00 [Invited Talk]
Electron Microscopy Study of Low Temperature Crystallization of a-SiGe Thin Film SDM2008-16 OME2008-16
Masaru Itakura, Masanobu Miyao (Kyushu Univ.)
(18) 10:00-10:25 Low-temperature Solid-Phase Crystallization of a-Ge on Glass Substrate for Advanced Thin-Film transistor SDM2008-17 OME2008-17 Isakane Nakao, Kaoru Toko (Kyushu Univ.), Takashi Noguchi (Univ. Ryukyus), Taizoh Sadoh (Kyushu Univ.)
  10:25-10:35 Break ( 10 min. )
(19) 10:35-11:00 Formation of Polycrystalline Si Thin Films Using Nanocrystalline Ge Nuclei SDM2008-18 OME2008-18 Chiaki Yoshimoto, Hiromasa Ohmi, Takayoshi Shimura, Hiroaki Kakiuchi, Heiji Watanabe, Kiyoshi Yasutake (Osaka Univ.)
(20) 11:00-11:25 Microstructural Analysis of Polycrystalline Silicon Thin Films Formation Behavior during Aluminum Induced Crystallization SDM2008-19 OME2008-19 Ken-ichi Ikeda (Kyushu Univ.), Takeshi Hirota (Mitsubishi Heavy Industries Ltd.), Kensuke Fujimoto (Kyushu Univ.), Youhei Sugimoto (Seiko Epson Corp.), Naoki Takata (Tokyo Inst. Tech.), Seiichiro Ii (Sojo Univ.), Hideharu Nakashima, Hiroshi Nakashima (Kyushu Univ.)
(21) 11:25-11:50 Low-temperature formation of poly-Ge on insulator by metal-induced lateral crystallization SDM2008-20 OME2008-20 Takashi Hagihara, Kaoru Toko, Taizoh Sadoh (Kyushu Univ.)

Contact Address and Latest Schedule Information
SDM Technical Committee on Silicon Device and Materials (SDM)   [Latest Schedule]
Contact Address Shigeru KAWANAKA (Toshiba)
TEL 045-776-5670, FAX 045-776-4104
E- geba 
OME Technical Committee on Organic Molecular Electronics (OME)   [Latest Schedule]
Contact Address  


Last modified: 2008-02-25 20:03:31


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