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Committee Date Time Place Paper Title / Authors Abstract Paper #
LQE, ED, CPM 2014-11-27
Osaka   The micro machining process technology of nano imprint and dry etching to improve the efficiency of nitride LED
Yukio Kashima, Eriko Matsuura (Marubun), Satoshi Shimatani (TOK), Mitsunori Kokubo, Takaharu Tashiro, Takafumi Ookawa (Toshiba Machine), Ryuichiro Kamimura, Yamato Osada (ULVAC), Sachie Fujikawa, Hideki Hirayama (RIKEN) ED2014-79 CPM2014-136 LQE2014-107
We fabricated the photonic crystal in nitride LED and improved the light extraction efficiency. We also introduce the mi... [more] ED2014-79 CPM2014-136 LQE2014-107
LQE, ED, CPM 2014-11-27
Osaka   Fabrication of high-quality AlN buffer layer for deep-UV LEDs grown on wet chemical etched patterned sapphire substrate
Yuya Kanazawa, Shiro Toyoda, Issei Ohshima (Saitama Univ./RIKEN), Norihiko Kamata (Saitama Univ.), Yukio Kashima (Marubun), Eriko Matsuura (MARUBUN), Satoshi Shimatani (TOK), Mitsunori Kokubo, Takaharu Tashiro (TOSHIBA MACHINE), Takashi Ohkawa, Ryuichiro Kamimura, Yamato Osada (ULVAC), Hideki Hirayama (RIKEN) ED2014-81 CPM2014-138 LQE2014-109
 [more] ED2014-81 CPM2014-138 LQE2014-109
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