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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 17 of 17  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2020-02-28
14:00
Tokyo Presentation Rm., KCB01, Tokyo Univ. of Technol.
(Cancelled but technical report was issued)
CPM2019-93  [more] CPM2019-93
pp.9-12
CPM 2019-08-26
14:20
Hokkaido Kitami Institute of Technology Preparation of conductive oxide sintered targets for AZO thin films deposited by sputtering method
Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Koutaro Nagata (Niigata Univ.) CPM2019-39
In this study, AZO conductive oxide sintered bodies with 2wt.% Al2O3 added to ZnO were prepared at sintering temperature... [more] CPM2019-39
pp.9-12
CPM, IEE-MAG 2018-11-01
14:50
Niigata Machinaka campus Nagaoka Consideration of bilayer film with Zn and AZO deposited by sputtering method
Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Koutaro Nagata, Nozomu Tsuboi (Niigata Univ.) CPM2018-45
In order to preparation of Zn doped AZO film, deposition of AZO films on Zn films were attempted by dc magnetron sputter... [more] CPM2018-45
pp.21-24
CPM 2017-07-22
10:57
Hokkaido   Examination of Relation between Al-doped ZnO Targets and Thin Films Deposited by Sputtering Method
Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Koutaro Nagata (Niigata Univ.) CPM2017-36
 [more] CPM2017-36
pp.79-83
CPM 2016-11-19
10:40
Ishikawa   Properties of Pd Ultrathin Film Deposited on Magnesium Phthalocyanine Films in Diluted Hydrogen Gas Atmosphere
Hidehiko Shimizu, Kazunari Shinbo, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.) CPM2016-71
 [more] CPM2016-71
pp.49-53
CPM 2015-11-07
09:00
Niigata Machinaka Campus Nagaoka Preparation of hydrogen addition to Mg-Ni thin films for electrochromic device by sputtering method
Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Koutarou Nagata (Niigata Univ.) CPM2015-93
 [more] CPM2015-93
pp.47-50
CPM 2012-10-26
14:15
Niigata   Examination of Resistivity of AZO Thin Films Deposited by Sputtering Method
Katsuhito Nagoshi, Yusuke Tomiguchi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) CPM2012-95
We examined the effects of the substrate temperature and post-annealing in vacuum less than 2.0×10-6 Torr of AZO thin fi... [more] CPM2012-95
pp.13-16
CPM 2012-10-27
10:00
Niigata   Mechanical Properties of the OLEDs and ITO Films Prepared on Plastic Substrates
Hiroaki Matsui, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) CPM2012-106
In order to examine that mechanical properties of OLEDs with ITO thin films deposited on PEN substrates at low temperatu... [more] CPM2012-106
pp.71-76
CPM 2011-10-26
13:25
Fukui Fukui Univ. Examination of ITO Thin Films for Flexible-OLEDs at Low-Voltage Driving
Chang Liu, Hiroaki Matsui, Takaaki Kibushi, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) CPM2011-110
In order to examine that properties of OLEDs with ITO thin films deposited at low temperature, ITO films was deposited o... [more] CPM2011-110
pp.5-9
CPM 2011-10-26
13:50
Fukui Fukui Univ. Properties of AZO Thin Films Deposited at Room Temperature by the RF-DC Coupled Magnetron Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Yusuke Tomiguchi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) CPM2011-111
In order to examine that influence of low voltage sputtering method on properties of AZO thin films, deposition of AZO t... [more] CPM2011-111
pp.11-15
EMD, CPM, OME 2011-06-30
16:55
Tokyo   Properties of AZO Thin Films Deposited at Room temperature by Low Voltage Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) EMD2011-18 CPM2011-54 OME2011-32
In order to examine that effect of high energy particles and fabricated conditions of targets, such as sintering tempera... [more] EMD2011-18 CPM2011-54 OME2011-32
pp.59-63
CPM 2010-10-28
17:05
Nagano   Formation of SrAl2O4:Eu, Dy thin films by combined the Unbalanced Magnetron Sputtering and the Facing Target Sputtering Method
Takashi Kuno, Minoru Saito, Kazuaki Kobayashi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.) CPM2010-97
In order to examine deposition rate and characteristics of thin films,SrAl2O4 : Eu2+,Dy3+ thin films was attempted by po... [more] CPM2010-97
pp.33-37
CPM 2010-10-29
11:50
Nagano   Examination of ITO Thin Films Deposited at Low-tempurature for OLEDs by Sputtering Method
Yohei Nakamura, Chang Liu, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-105
In order to examine problems of the ITO films deposited at the low-temperature, the ITO films was deposited at the low-t... [more] CPM2010-105
pp.71-75
CPM 2010-07-29
14:20
Hokkaido Michino-Eki Shari Meeting Room Characteristic of AZO thin films deposited at room temperature by sputtering method
Hidehiko Shimizu, Jun Kashiide, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-32
 [more] CPM2010-32
pp.5-9
CPM 2009-10-30
10:50
Toyama Toyama Prefectural University Examination of high speed deposition method for SrAl2O4 thin films by sputtering method
Masakazu Koketsu, Takashi Kuno, Minoru Saito, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.) CPM2009-100
 [more] CPM2009-100
pp.53-57
CPM 2009-10-30
11:15
Toyama Toyama Prefectural University Examination of the Mg based alloy thin films by sputtering method
Tomohiro Okada, Takeru Shimizu, Toshiro Tannai, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ) CPM2009-101
 [more] CPM2009-101
pp.59-63
CPM 2008-10-31
09:50
Niigata Niigata Univ. Examination of Ar ion bombardment effect to ITO Thin Films
Saki Takahashi, Masato Niki, Youhei Nakamura, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnio Univ.) CPM2008-84
In order to examine deposition method to crystallize an ITO film at low temperature, deposition of ITO thin films was at... [more] CPM2008-84
pp.53-58
 Results 1 - 17 of 17  /   
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