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Committee Date Time Place Paper Title / Authors Abstract Paper #
ED 2009-04-24
Miyagi Tohoku Univ. Growth of polycrystalline Si on plastic substrate using pulsed-plasma CVD under near atmospheric Pressure
Shogo Murashige, Mitsutaka Matsumoto, Yohei Inayoshi, Maki Suemitsu (Tohoku Univ.), Setsuo Nakajima, Tsuyoshi Uehara (Sekisui Chemicals Co. Ltd), Yasutake Toyoshima (AIST-ETRI) ED2009-15
Polycrystalline Si films have been deposited on polyethylene terephthalate(PET) substrates using pulsed-plasma CVD under... [more] ED2009-15
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