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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 6 of 6  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, OME 2021-04-23
15:50		 Okinawa Okinawaken Seinen Kaikan
(Primary: On-site, Secondary: Online)		 [Invited Talk] Challenge for oxide TFTs toward LTPS TFTs
Mamoru Furuta (Kochi Univ. of Technol.) SDM2021-5 OME2021-5		  [more] SDM2021-5 OME2021-5
pp.19-21
EID, SDM, ITE-IDY [detail] 2020-12-02
14:30		 Online Online [Special Invited Talk] Defects control in oxide semiconductors at low-temperature and its application to flexible devices
Yusaku Magari, Mamoru Furuta (Kochi Univ. of Technol.) EID2020-10 SDM2020-44		 High-performance In–Ga–Zn–O (IGZO) Schottky diodes (SDs) were fabricated using hydrogenated IGZO (IGZO:H) at a maximum p... [more] EID2020-10 SDM2020-44
pp.37-41
SDM, OME 2016-04-09
10:10		 Okinawa Okinawa Prefectural Museum & Art Museum [Invited Talk] Low-temperature processed self-aligned InGaZnO thin-film transistors for flexible device applications
Mamoru Furuta, Tatsuya Toda, Gengo Tatsuoka, Yusaku Magari (Kochi Univ. of Technol.) SDM2016-13 OME2016-13		  [more] SDM2016-13 OME2016-13
pp.53-56
EID, ITE-IDY, IEE-EDD, SID-JC, IEIJ-SSL [detail] 2016-01-28
15:04		 Toyama Toyama Univ. Plasma treatment for source/drain regions of self-aligned InGaZnO thin-film transistors -- Effects of substrate bias during the plasma treatment of IGZO. --
Yusaku Magari, Tatsuya Toda, Hisao Makino, Mamoru Furuta (Kochi Univ. of Technol.) EID2015-31		  [more] EID2015-31
pp.41-44
SDM, EID 2014-12-12
15:15		 Kyoto Kyoto University Characterization of the touch panel circuit using ITZO TFTs
Yuki Koga, Tokiyoshi Matsuda (Ryukoku Univ.), Mamoru Furuta (Kochi Univ. of Technol.), Mutsumi Kimura (Ryukoku Univ.) EID2014-30 SDM2014-125		 Oxide TFTs using ITZO for the active layer (ITZO TFTs) have attracted attention as a driving element of flatpanel displ... [more] EID2014-30 SDM2014-125
pp.89-93
EID, ITE-IDY, IEE-EDD, IEIJ-SSL 2011-01-29
09:55		 Kochi Kochi University of Technology Deposition of Insulator Film with New Facing Electrodes CVD for Low Temperature Devices
Tokiyoshi Matsuda, Mamoru Furuta, Takahiro Hiramatsu, Hiroshi Furuta, Takashi Hirao (Kochi Univ. of Technol.) EID2010-35		 Insulating SiO_{\it x} film was deposited at low temperature with newly developed plasma source for low heat resistive s... [more] EID2010-35
pp.87-90
 Results 1 - 6 of 6  /   
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