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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
NS, ICM, CQ, NV (Joint) |
2022-11-25 15:25 |
Fukuoka |
Humanities and Social Sciences Center, Fukuoka Univ. + Online (Primary: On-site, Secondary: Online) |
[Invited Talk]
AI and Sensing Techniques enabled by Post-5G Networks Takahito Tanimura, Hisanori Matsumoto, Norikatsu Takaura, Akio Shima, Michitaka Okuno (Hitachi) NS2022-126 CQ2022-59 ICM2022-29 |
In post-5G/6G era as a successor of current 5G era, it will be realized that both evolving communication functions, such... [more] |
NS2022-126 CQ2022-59 ICM2022-29 p.136(NS), p.57(CQ), p.30(ICM) |
SDM |
2016-11-10 11:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Channel Properties of SiC Trench-Etched Double-Implanted MOS (TED MOS) Naoki Tega, Digh Hisamoto, Akio Shima, Yasuhiro Shimamoto (Hitachi) SDM2016-80 |
We comprehensively studied the channel properties of a silicon carbide trench-etched double-implanted MOS (SiC TED MOS).... [more] |
SDM2016-80 pp.9-14 |
ICD, SDM |
2012-08-02 15:55 |
Hokkaido |
Sapporo Center for Gender Equality, Sapporo, Hokkaido |
Scalable 3-D vertical chain-cell-type phase-change memory with 4F2 poly-Si diodes Masaharu Kinoshita, Yoshitaka Sasago, Hiroyuki Minemura, Yumiko Anzai, Mitsuharu Tai, Yoshihisa Fujisaki, Shuichi Kusaba, Tadao Morimoto, Takashi Takahama, Toshiyuki Mine, Akio Shima, Yoshiki Yonamoto, Takashi Kobayashi (Hitachi) SDM2012-74 ICD2012-42 |
A three-dimensional (3-D) vertical chain-cell-type phase-change memory (VCCPCM) for next-generation large-capacity stora... [more] |
SDM2012-74 ICD2012-42 pp.59-63 |
SDM |
2011-11-10 13:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Phase-change memoy driven by poly-Si transistor enabling three-dimensional stacking Yoshitaka Sasago, Masaharu Kinoshita, Hiroyuki Minemura, Yumiko Anzai, Mitsuharu Tai, Kenzo Kurotsuchi, Seiichi Morita, Toshikazu Takahashi, Takashi Takahama, Tadao Morimoto, Toshiyuki Mine, Akio Shima, Takashi Kobayashi (Hitachi) SDM2011-117 |
A phase-change memory (PCM) driven by poly-Si MOS transistors was fabricated. The thin phase-change-material layer depos... [more] |
SDM2011-117 pp.11-15 |
SDM, ICD |
2011-08-26 09:50 |
Toyama |
Toyama kenminkaikan |
Phase-change memory driven by poly-Si MOS transistor with low cost and high-programming throughput Yoshitaka Sasago, Masaharu Kinoshita, Hiroyuki Minemura, Yumiko Anzai, Mitsuharu Tai, Kenzo Kurotsuchi, Seiichi Morita, Toshikazu Takahashi, Takashi Takahama, Tadao Morimoto, Toshiyuki Mine, Akio Shima, Takashi Kobayashi (Hitachi) SDM2011-85 ICD2011-53 |
A phase-change memory (PCM) driven by poly-Si MOS transistors was fabricated. The thin phase-change-material layer depos... [more] |
SDM2011-85 ICD2011-53 pp.75-78 |
ITE-MMS, MRIS |
2009-10-09 10:25 |
Fukuoka |
FUKUOKA traffic center |
[Invited Talk]
Low cost technology of phase change memory with low-contact-resistivity poly-Si selection diode Yoshitaka Sasago, Masaharu Kinoshita, Takahiro Morikawa, Kenzo Kurotsuchi, Satoru Hanzawa, Toshiyuki Mine, Akio Shima, Yoshihisa Fujisaki, Hiroshi Moriya, Norikatsu Takaura, Kazuyoshi Torii (Hitachi) MR2009-26 |
We have fabricated the cross-point phase change memory with a selection diode made of poly-Si. The selection diode was f... [more] |
MR2009-26 pp.31-35 |
ICD, SDM |
2009-07-17 12:00 |
Tokyo |
Tokyo Institute of Technology |
Cross-Point phase change memory with 4F2 cell size driven by low-contact resistivity poly-si diode Yoshitaka Sasago, Masaharu Kinoshita, Takahiro Morikawa, Kenzo Kurotsuchi, Satoru Hanzawa, Toshiyuki Mine, Akio Shima, Yoshihisa Fujisaki, Hitoshi Kume, Hiroshi Moriya, Norikatsu Takaura, Kazuyoshi Torii (Hitachi) SDM2009-112 ICD2009-28 |
We have fabricated the cross-point phase change memory with a selection diode made of poly-Si. The selection diode was f... [more] |
SDM2009-112 ICD2009-28 pp.79-83 |
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