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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 6 of 6  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
VLD, HWS, ICD 2024-02-29
14:00		 Okinawa
(Primary: On-site, Secondary: Online)		 Nano Artifact Metric Systems Resistant Against Clones Produced by Scanning Probe Lithography
Akira Iwahashi, Naoki Yoshida, Katsunari Yoshioka (YNU), Tsutomu Matsumoto (AIST) VLD2023-113 HWS2023-73 ICD2023-102		  [more] VLD2023-113 HWS2023-73 ICD2023-102
pp.83-88
VLD, HWS, ICD 2024-03-02
09:45		 Okinawa
(Primary: On-site, Secondary: Online)		 Demonstrating a Real Car Covered with Infra-red-cut Films to Hide itself from LiDAR
Yuki Fukatsu, Akira Iwahashi, Naoki Yoshida, Tsutomu Matsumoto (YNU) VLD2023-135 HWS2023-95 ICD2023-124		 In recent years, various technologies have been developed toward the practical application of fully automated driving. A... [more] VLD2023-135 HWS2023-95 ICD2023-124
pp.190-195
EMM, BioX, ISEC, SITE, ICSS, HWS, IPSJ-CSEC, IPSJ-SPT [detail] 2023-07-25
11:40		 Hokkaido Hokkaido Jichiro Kaikan Clone Resistance of Artifact Metrics: Spatial Frequency Filtering
Akira Iwahashi, Iwaki Miyamoto, Naoki Yoshida, Tsutomu Matsumoto (YNU) ISEC2023-43 SITE2023-37 BioX2023-46 HWS2023-43 ICSS2023-40 EMM2023-43		 Artifact metrics is a technology that uses features unique to an artifact to authenticate the artifact in question. Unli... [more] ISEC2023-43 SITE2023-37 BioX2023-46 HWS2023-43 ICSS2023-40 EMM2023-43
pp.188-193
HWS 2023-04-15
10:05		 Oita
(Primary: On-site, Secondary: Online)		 Clone Resistance of Artifact Metric Systems Based on White Light Interferometry and Correlation coefficient
Akira Iwahashi, Naoki Yoshida, Tsutomu Matsumoto (YNU) HWS2023-11		 Artifact metrics are a technology that authenticates artifacts using features unique to each artifact. Unlike convention... [more] HWS2023-11
pp.43-48
HWS, VLD 2023-03-04
11:05		 Okinawa
(Primary: On-site, Secondary: Online)		 Clone Resistance of Artifact Metrics: Scanning Probe Lithography Based Clones
Naoki Yoshida, Akira Iwahashi (YNU), Hoga Morihisa, Junko Ohta, Kaoru Sumiya (AIST), Tsutomu Matsumoto (YNU) VLD2022-117 HWS2022-88		 The nano-artifact metrics bases its security on the fact that nanometer-order three-dimensional structures (nanopatterns... [more] VLD2022-117 HWS2022-88
pp.245-250
HWS, VLD 2023-03-04
11:30		 Okinawa
(Primary: On-site, Secondary: Online)		 Clone Resistance of Artifact Metrics Systems Based on White Light Interferometry and Phase Only Correlation
Akira Iwahashi, Naoki Yoshida, Tsutomu Matsumoto (YNU) VLD2022-118 HWS2022-89		 Artifact Metrics is a technique for authenticating artifacts using characteristics unique to each artifact. Unlike conve... [more] VLD2022-118 HWS2022-89
pp.251-256
 Results 1 - 6 of 6  /   
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