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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| VLD, HWS, ICD | 2024-02-28 15:30 |
Okinawa | (Primary: On-site, Secondary: Online) |
A Template Routing Method Using SMT Solver for Double Via-Constrained Pair Symmetric Routing Problem Zuan Jo, Satoshi Tayu, Atsushi Takahashi (Tokyo Tech), Mathieu Molongo, Makoto Minami, Katsuya Nishioka (JEDAT)  VLD2023-102 HWS2023-62 ICD2023-91 |
[more] | VLD2023-102 HWS2023-62 ICD2023-91 pp.18-23 |
| VLD, HWS, ICD | 2024-02-28 15:55 |
Okinawa | (Primary: On-site, Secondary: Online) |
Three-layer Bottleneck Channel Track Assignment for Pins Placed on Opposite Sides Kazuya Taniguchi, Satoshi Tayu, Atsushi Takahashi (Tokyo Tech), Mathieu Molongo, Makoto Minami, Katsuya Nishioka (Jedat) VLD2023-103 HWS2023-63 ICD2023-92 |
In this paper, for a three-layer bottleneck channel routing problem in which pins of each net are placed on the upper or... [more] | VLD2023-103 HWS2023-63 ICD2023-92 pp.24-29 |
| VLD, HWS, ICD | 2024-02-28 16:20 |
Okinawa | (Primary: On-site, Secondary: Online) |
Single Trunk Routing Problem for Generalized Channel Zezhong Wang, Masayuki Shimoda, Atsushi Takahashi (Tokyo Tech) VLD2023-104 HWS2023-64 ICD2023-93 |
This paper addresses the challenges posed by tight horizontal routing capacity in critical layers of chip design. A Gene... [more] | VLD2023-104 HWS2023-64 ICD2023-93 pp.30-35 |
| HWS, VLD | 2023-03-01 14:55 |
Okinawa | (Primary: On-site, Secondary: Online) |
High fidelity mask pattern generation method by amplitude component evaluation Yu Horimoto, Sota Saito, Atsushi Takahashi (Tokyo Tech), Yukihide Kohira (Univ. of Aizu), Chikaaki Kodama (KIOXIA) VLD2022-79 HWS2022-50 |
[more] | VLD2022-79 HWS2022-50 pp.37-42 |
| HWS, VLD | 2023-03-01 15:20 |
Okinawa | (Primary: On-site, Secondary: Online) |
A fast SRAF optimization using Voronoi diagram and LUT based intensity evaluation Sota Saito, Yu Horimoto, Atsushi Takahashi (Tokyo Tech), Yukihide Kohira (Univ. of Aizu), Chikaaki Kodama (KIOXIA) VLD2022-80 HWS2022-51 |
Recent advances in technology nodes have led to problems in optical lithography such as reduced fidelity of transferred ... [more] | VLD2022-80 HWS2022-51 pp.43-48 |
| HWS, VLD | 2023-03-03 09:55 |
Okinawa | (Primary: On-site, Secondary: Online) |
Track Assignment considering Routing Crossing Relations to Improve Feasibility in Bottleneck Channel Routing Kazuya Taniguchi, Satoshi Tayu, Atsushi Takahashi (Tokyo Tech), Molongo Mathieu, Makoto Minami, Katsuya Nishioka (Jedat) VLD2022-101 HWS2022-72 |
Design automation that realizes analog integrated circuits to meet performance specifications in a small area is desired... [more] | VLD2022-101 HWS2022-72 pp.149-154 |
| HWS, VLD | 2023-03-03 10:20 |
Okinawa | (Primary: On-site, Secondary: Online) |
Pair Symmetrical Routing in Common Centroid Placement with Common Signal Constraints Zuan Jo, Satoshi Tayu, Atsushi Takahashi (Tokyo Tech), Molongo Mathieu, Makoto Minami, Katsuya Nishioka (JEDAT) VLD2022-102 HWS2022-73 |
In analog integrated circuits, designs usually rely on the relative accuracy of device characteristics. The purpose of t... [more] | VLD2022-102 HWS2022-73 pp.155-160 |
| VLD, DC, RECONF, ICD, IPSJ-SLDM [detail] | 2022-11-30 10:20 |
Kumamoto | (Primary: On-site, Secondary: Online) |
A fast SRAF optimization used LUT based point intensity calculation Sota Saito, Atsushi Takahashi (Tokyo Tech) VLD2022-40 ICD2022-57 DC2022-56 RECONF2022-63 |
Recent advances in technology nodes have led to problems in optical lithography such as reduced fidelity of transferred ... [more] | VLD2022-40 ICD2022-57 DC2022-56 RECONF2022-63 pp.121-126 |
| VLD, DC, RECONF, ICD, IPSJ-SLDM [detail] | 2022-11-30 10:45 |
Kumamoto | (Primary: On-site, Secondary: Online) |
Mask Optimization Using Voronoi Partition and Iterative Improvement Naoki Nonaka, Yukihide Kohira (Univ. of Aizu), Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2022-41 ICD2022-58 DC2022-57 RECONF2022-64 |
To realize continuously scaling down technology node, progressing manufacturing process by optical lithography is requir... [more] | VLD2022-41 ICD2022-58 DC2022-57 RECONF2022-64 pp.127-132 |
| VLD, HWS [detail] | 2022-03-07 09:35 |
Online | Online | Bottleneck Channel Routing to Reduce the Area of Analog VLSI Kazuya Taniguchi, Satoshi Tayu, Atsushi Takahashi (Tokyo Tech), Yukichi Todoroki, Makoto Minami (Jedat) VLD2021-77 HWS2021-54 |
Design automation that realizes analog integrated circuits to meet performance specifications in a small area is desired... [more] | VLD2021-77 HWS2021-54 pp.7-12 |
| VLD, DC, RECONF, ICD, IPSJ-SLDM (Joint) [detail] |
2021-12-02 15:35 |
Online | Online | Mask Optimization Method Using Simulated Quantum Annealing Yukihide Kohira, Haruki Nakayama, Naoki Nonaka (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA Corporation) VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 |
To realize continuously scaling down of technology node, progressing manufacturing process by optical lithography is req... [more] | VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 pp.162-167 |
| BioX, CNR | 2020-03-04 17:10 |
Tokyo | (Cancelled but technical report was issued) |
Pre-classifier Using Finger Pressure and Touch Area on Tablet in Person Verification Based on Finger-Writing of Simple Symbol Yohei Masegi, Atsushi Takahashi, Isao Nakanishi (Tottori Univ.) BioX2019-66 CNR2019-49 |
[more] | BioX2019-66 CNR2019-49 pp.25-30 |
| HWS, VLD [detail] | 2020-03-04 09:55 |
Okinawa | Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
A Pin-Pair Routing Method for Length Difference Reduction in Set-Pair Routing Kunihiko Wada, Shimpei Sato, Atsushi Takahashi (TokyoTech) VLD2019-95 HWS2019-68 |
In this paper, we propose a Routing method that aims to reduce total wire length and wire length difference for Set-Pair... [more] | VLD2019-95 HWS2019-68 pp.7-12 |
| HWS, VLD [detail] | 2020-03-04 16:00 |
Okinawa | Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-105 HWS2019-78 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] | VLD2019-105 HWS2019-78 pp.65-70 |
| HWS, VLD [detail] | 2020-03-04 16:25 |
Okinawa | Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Machine Learning Based Lithography Hotspot Detection Method and Evaluation Hidekazu Takahashi, Shimpei Sato, Atsushi Takahashi (Tokyo Tech) VLD2019-106 HWS2019-79 |
As VLSI device feature sizes are getting smaller and smaller, layout design has become more important to keep the yield... [more] |
VLD2019-106 HWS2019-79 pp.71-76 |
| VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 16:10 |
Ehime | Ehime Prefecture Gender Equality Center | Analysis of databases used for hot spot test cases Hiroki Ogura, Hidekazu Takahashi, Sinpei Sato, Atsushi Takahashi (Tokyo Tech) VLD2019-52 DC2019-76 |
With the miniaturization of semiconductor circuit patterns, the importance of photolithography has increased. In the sta... [more] | VLD2019-52 DC2019-76 pp.191-196 |
| VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 16:35 |
Ehime | Ehime Prefecture Gender Equality Center | Mask Optimization Considering Process Variation by Subgradient Method Yukihide Kohira, Rina Azuma (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-53 DC2019-77 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] | VLD2019-53 DC2019-77 pp.197-202 |
| HWS, VLD | 2019-02-27 13:55 |
Okinawa | Okinawa Ken Seinen Kaikan | Set-Pair Routing Algorithm with Selective Pin-Pair Connections Kano Akagi, Shimpei Sato, Atsushi Takahashi (Tokyo Tech) VLD2018-99 HWS2018-62 |
We propose a set-pair routing algorithm which efficiently generates a length matched routing pattern. In our algorithm, ... [more] | VLD2018-99 HWS2018-62 pp.37-42 |
| IPSJ-SLDM, RECONF, VLD, CPSY, IPSJ-ARC [detail] | 2019-01-30 10:30 |
Kanagawa | Raiosha, Hiyoshi Campus, Keio University | On Delay Optimization for Improving General Synchronous Performance Eijiro Sassa, Shimpei Sato, Atsushi Takahashi (Tokyo Tech) VLD2018-72 CPSY2018-82 RECONF2018-46 |
[more] | VLD2018-72 CPSY2018-82 RECONF2018-46 pp.1-6 |
| NC, MBE (Joint) |
2018-12-15 15:30 |
Aichi | Nagoya Institute of Technology | Proposal of Analysis Accuracy Improvement Method by Logistic Regression in Single Nucleotide Polymorphism Analysis Using Next-Generation Sequencer Ginji Azuma (Kindai Univ.), Atsushi Takahashi (NCVC), Naoki Ohboshi (Kindai Univ.) NC2018-37 |
Single nucleotide polymorphisms are known to be related to phenotypes, and analysis is actively performed. However, the ... [more] | NC2018-37 pp.51-55 |
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