IEICE Technical Committee Submission System
Conference Schedule		 Online Proceedings
[Sign in]
Tech. Rep. Archives
    [Japanese] / [English] 
( Committee/Place/Topics  ) --Press->
 
( Paper Keywords:  /  Column:Title Auth. Affi. Abst. Keyword ) --Press->

All Technical Committee Conferences  (Searched in: All Years)

Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 5 of 5  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2013-10-17
14:50		 Miyagi Niche, Tohoku Univ. Electrical Properties and Reliability of Ultrathin HfN Gate Insulator Formed on Si(100) and Si(110)
Nithi Atthi, Dae-Hee Han, Shun-ichiro Ohmi (Tokyo Inst. of Tech.) SDM2013-89		  [more] SDM2013-89
pp.5-9
SDM 2013-10-17
15:40		 Miyagi Niche, Tohoku Univ. Effect of silicon surface roughness on 3-D MOS capacitor with ultrathin HfON gate insulator formed by ECR plasma sputtering
Dae-Hee Han, Shun-ichiro Ohmi (Tokyo Inst. of Tech.) SDM2013-90		  [more] SDM2013-90
pp.11-14
SDM 2012-10-26
13:25		 Miyagi Tohoku Univ. (Niche) Effect of silicon surface roughness on MOSFET performance with ultra-thin HfON gate insulator formed by ECR sputtering
Dae-Hee Han, Shun-ichiro Ohmi (Tokyo Inst. of Tech.) SDM2012-96		  [more] SDM2012-96
pp.37-40
SDM, ED
(Workshop)		 2012-06-28
10:15		 Okinawa Okinawa Seinen-kaikan Effect of Si surface roughness on EOT reduction for HfON gate insulator formed by ECR plasma oxidation of HfN
Dae-Hee Han, Shun-ichiro Ohmi (Tokyo Tech) 		 [more]
SDM 2011-10-20
15:20		 Miyagi Tohoku Univ. (Niche) Effect of Si surface roughness on electrical characteristics of HfON gate insulator
Dae-Hee Han, Shun-ichiro Ohmi (Tokyo Inst. of Tech.) SDM2011-100		 In this paper, the effect of Si surface roughness on electrical characteristics of HfON gate insulator formed by the ele... [more] SDM2011-100
pp.17-20
 Results 1 - 5 of 5  /   
Choose a download format for default settings. [NEW !!]
Text format pLaTeX format CSV format BibTeX format
Copyright and reproduction : All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan