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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 6 of 6  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2024-02-21
15:50		 Tokyo Tokyo University-Hongo-Engineering Bldg.4
(Primary: On-site, Secondary: Online)		 [Invited Talk] Recent Studies of WoW and CoW Cu-Cu Hybrid Bonding
Yoshihisa Kagawa, Yukako Ikegami, Takahiro Kamei, Hayato Iwamoto (SSS) SDM2023-87		 In recent years, a variety of 3D stacked devices have been proposed. The Cu-Cu hybrid bonding that can realize high dens... [more] SDM2023-87
pp.31-35
SDM 2022-02-04
11:20		 Online Online [Invited Talk] 3D Sequential Process Integration for CMOS Image Sensor
Keiichi Nakazawa, Junpei Yamamoto, Nobutoshi Fujii, Mutsuo Uehara, Katsunori Hiramatsu, Hideomi Kumano, Shigetaka Mori, Shintaro Okamoto, Akito Shimizu, Koichi Baba, Hidetoshi Onuma, Akira Matsumoto, Koichiro Zaitsu, Keiji Tanani, Tomoyuki Hirano, Hayato Iwamoto (Sony Semiconductor Solutions) SDM2021-77		 We developed a new structure of pixel transistors stacked over photodiode named “2-Layer Transistor Pixel Stacked CMOS I... [more] SDM2021-77
pp.13-16
SDM 2022-01-31
16:00		 Online Online [Invited Talk] ****
Keiichi Nakazawa, Junpei Yamamoto, Shigetaka Mori, Shintaro Okamoto, Akito Shimizu, Koichi Baba, Nobutoshi Fujii, Mutsuo Uehara, Katsunori Hiramatsu, Hideomi Kumano, Akira Matsumoto, Koichiro Zaitsu, Hidetoshi Ohnuma, Keiji Tatani, Tomoyuki Hirano, Hayato Iwamoto (Sony Semiconductor Solutions) SDM2021-73		 We developed a new structure of pixel transistors stacked over photodiode named “2-Layer Transistor Pixel Stacked CMOS I... [more] SDM2021-73
pp.20-23
SDM 2021-02-05
14:25		 Online Online [Invited Talk] Impacts of Misalignment on 1um Pitch Cu-Cu Hybrid Bonding
Yoshihisa Kagawa, Takumi Kamibayashi, Masaki Haneda, Nobuotoshi Fujii, Syunsuke Furuse, Hideto Hashiguch, Tomoyuki Hirano, Hayato Iwamoto (SSS) SDM2020-58		 In this study, we have successfully demonstrated the 1um pitch Cu-Cu hybrid bonding technology with remarkable electrica... [more] SDM2020-58
pp.15-18
ED 2009-06-11
14:30		 Tokyo   Development of bevel brush scrubbing process
Yoshiya Hagimoto, Hayato Iwamoto (Sony Corp.) ED2009-38		  [more] ED2009-38
pp.11-14
SDM 2006-06-22
09:25		 Hiroshima Faculty Club, Hiroshima Univ. Gate Oxide Process Dependence of CMOS Performance on Si(110) Surface
Susumu Hiyama, Junli Wang, Takayoshi Kato, Tomoyuki Hirano, Kaori Tai, Hayato Iwamoto (Sony) 		We investigated gate oxide process dependence of hole mobility on Si(110) surface. We used RTO and radical oxidization a... [more] SDM2006-53
pp.65-69
 Results 1 - 6 of 6  /   
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