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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2019-10-24
Miyagi Niche, Tohoku Univ. Gas concentration distribution measurement in semiconductor process chamber using a high SNR CMOS absorption image sensor
Keigo Takahashi, Yhang Ricardo Sipauba Carvalho da Silva, Rihito Kuroda, Yasuyuki Fujihara, Maasa Murata, Hidekazu Ishii, Tatsuo Morimoto, Tomoyuki Suwa, Akinobu Teramoto, Shigetoshi Sugawa (Tohoku Univ.) SDM2019-66
This paper reports on gas concentration imaging using lateral overflow integration trench capacitor(LOFITreC) CMOS absor... [more] SDM2019-66
SDM 2017-10-26
Miyagi Niche, Tohoku Univ. A High Sensitivity Realtime Compact Gas Concentration Sensor using UV absorption spectroscopy and Charge Amplifier Circuit
Hidekazu Ishii (Tohoku Univ.), Masaaki Nagase, Nobukazu Ikeda (Fujikin Inc.), Yoshinobu Shiba, Yasuyuki Shirai, Rihito Kuroda, Shigetoshi Sugawa (Tohoku Univ.) SDM2017-56
Metal organic (MO) gases are used in electronic device manufacturing processes such as semiconductors, power devices, LE... [more] SDM2017-56
SDM 2016-10-27
Miyagi Niche, Tohoku Univ. Effects of the oxidizing species on the interface of Al2O3 film by atomic layer deposition
Masaya Saito, Tomoyuki Suwa, Akinobu Teramoto, Rihito Kuroda, Yasumasa Koda, Hisaya Sugita, Hidekazu Ishii, Yoshinobu Shiba, Yasuyuki Shirai, Shigetoshi Sugawa (Tohoku univ.), Marie Hayashi, Junichi Tsuchimoto (CANON ANELVA) SDM2016-73
Al2O3 is a prospective high-dielectric material for the gate insulator film of the power devices and MIM (Metal-Insulato... [more] SDM2016-73
SDM 2015-10-30
Miyagi Niche, Tohoku Univ. Low Work Function LaB6 Thin Films Prepared by Nitrogen Doped LaB6 Target Sputtering
Hidekazu Ishii (Tohoku Univ), Takahashi Kentarou (Sumitomo Osaka Cement), Tetsuya Goto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ) SDM2015-81
LaB6 thin films were deposited by magnetron sputtering, and their work function was investigated. It was found that the ... [more] SDM2015-81
SDM 2015-10-30
Miyagi Niche, Tohoku Univ. Study of process temperature of Al2O3 atomic layer deposition using high accuracy process gasses supply controller
Hisaya Sugita, Yasumasa Koda, Tomoyuki Suwa, Rihito Kuroda, Tetsuya Goto, Hidekazu Ishii (Tohoku Univ.), Satoru Yamashita (Fujikin), Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.) SDM2015-83
 [more] SDM2015-83
SDM 2011-10-21
Miyagi Tohoku Univ. (Niche) High Purity Metal Organic Gas Distribution System
Satoru Yamashita, Hidekazu Ishii, Yoshinobu Shiba, Masafumi Kitano, Yasuyuki Shirai, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.) SDM2011-112
The gas flow control is important factor that influenced to the concentration of process gas and the pressure of process... [more] SDM2011-112
 Results 1 - 6 of 6  /   
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