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All Technical Committee Conferences (Searched in: All Years)
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| Search Results: Conference Papers |
| Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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| Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
| ICD, SDM, ITE-IST [detail] |
2016-08-02
10:40 |
Osaka |
Central Electric Club |
[Invited Talk]
Patch-type EEG System with Stretchable Electrode Sheet for Medical Application
Shusuke Yoshimoto, Teppei Araki, Takafumi Uemura, Toshikazu Nezu, Masaya Kondo (Osaka Univ.), Kenichi Sasai (Panasonic), Masayuki Iwase, Hideki Satake, Akio Yoshida (Mektron), Mitsuru Kikuchi (Kanazawa Univ.), Tsuyoshi Sekitani (Osaka Univ.)  SDM2016-56 ICD2016-24 |
[more] |
SDM2016-56 ICD2016-24
p.63 |
| SDM |
2006-06-22
11:20 |
Hiroshima |
Faculty Club, Hiroshima Univ. |
Influence of Nitrogen and Hydrogen on NBTI in Ultrathin SiON
Yuichiro Mitani, Hideki Satake (Toshiba Corp.) |
NBTI(Negative Bias Temperature Instability) has become increasingly serious in the context of effort to develop highly r... [more] |
SDM2006-57
pp.87-92 |
| SDM |
2006-06-22
14:15 |
Hiroshima |
Faculty Club, Hiroshima Univ. |
unknown
Wataru Mizubayashi (MIRAI-ASRC, AIST), Arito Ogawa, Toshihide Nabatame, Hideki Satake (MIRAI-ASET), Akira Toriumi (MIRAI-ASRC, AIST, Univ. of Tokyo) |
[more] |
SDM2006-61
pp.107-111 |
| ICD, SDM |
2005-08-19
11:10 |
Hokkaido |
HAKODATE KOKUSAI HOTEL |
Improvement of threshold voltage asymmetry by Al compositional mudulation and partially silicided gate electrode for Hf-based high-k CMOSFETs
Masaru Kadoshima, Arito Ogawa, Masashi Takahashi (MIRAI-ASET), Hiroyuki Ota (MIRAI-ASRC, AIST), Nobuyuki Mise, Kunihiko Iwamoto (MIRAI-ASET), Shinji Migita (MIRAI-ASRC, AIST), Hideaki Fujiwara, Hideki Satake, Toshihide Nabatame (MIRAI-ASET), Akira Toriumi (MIRAI-ASRC, AIST, The Univ. of Tokyo) |
Threshold voltage (Vth) tuning by engineering Fermi-level pinning (FLP) on HfAlOx(N) dielectrics is demonstrated for CMO... [more] |
SDM2005-148 ICD2005-87
pp.31-36 |
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