Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2019-11-08 09:30 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Device Simulation of Dynamic Behavior of Ferroelectric Field-Effect Transistors Junichi Hattori, Tsutomu Ikegami, Koichi Fukuda, Hiroyuki Ota, Shinji Migita, Hidehiro Asai (AIST) SDM2019-74 |
We propose a method to simulate the dynamic behavior of field-effect transistors (FETs) having ferroelectric materials i... [more] |
SDM2019-74 pp.27-32 |
IMQ, IE, MVE, CQ (Joint) [detail] |
2019-03-15 10:40 |
Kagoshima |
Kagoshima University |
Image quality evaluation of low contrast CT images using moving average filters Keisuke Fujii (Nagoya Univ./NCCHE), Kuniharu Imai, Mitsuru Ikeda, Chiyo Yamauchi-Kawaura (Nagoya Univ.), Keiichi Nomura, Yoshihisa Muramatsu, Hiroyuki Ota (NCCHE) IMQ2018-60 IE2018-144 MVE2018-91 |
Image contrast and noise are one of important indices for evaluating image quality of low contrast CT images such as abd... [more] |
IMQ2018-60 IE2018-144 MVE2018-91 pp.209-212 |
SDM |
2019-01-29 09:30 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Multidomain Dynamics of Ferroelectric Polarization in Negative Capacitance State and its Impacts on Performances of Field-Effect Transistors Hiroyuki Ota, Tsutomu Ikegami, Koichi Fukuda, Junichi HattoriI, Hidehiro Asai, Kazuhiko Endo, Shinji Migita (AIST), Akira Toriumi (The Univ. of Tokyo) SDM2018-81 |
In this paper, we clarified the multidomain dynamics of ferroelectric polarization in the Negative Capacitance Field-Eff... [more] |
SDM2018-81 pp.1-4 |
SDM |
2019-01-29 09:55 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Assessment of Steep-Subthreshold Swing Behaviors in Ferroelectric Field-Effect Transistors Shinji Migita, Hiroyuki Ota (AIST), Akira Thorium (U. Tokyo) SDM2018-82 |
Steep-subthreshold swing (steep-SS) behaviors are observable in recent ferroelectric-gate field-effect transistors (FE-F... [more] |
SDM2018-82 pp.5-8 |
SDM |
2018-11-09 14:20 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Device Simulation of Field-Effect Transistor Using Ferroelectric Negative Capacitance Junichi Hattori, Tsutomu Ikegami, Koichi Fukuda, Hiroyuki Ota, Shinji Migita, Hidehiro Asai (AIST) SDM2018-74 |
We consider the method to simulate negative-capacitance field-effect transistors (NC FETs) harnessing negative capacitan... [more] |
SDM2018-74 pp.47-52 |
SDM |
2018-06-25 16:15 |
Aichi |
Nagoya Univ. VBL3F |
Concern of Ferroelectric HfO2 Films Brought by Large Coercive Field Shinji Migita, Hiroyuki Ota (AIST), Akira Toriumi (Univ. Tokyo) SDM2018-25 |
Ferroelectric HfO2-based thin films are attractive memory materials for application in LSI. These ferroelectrics have la... [more] |
SDM2018-25 pp.43-46 |
SDM |
2018-01-30 11:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Perspective of Negative Capacitance FinFETs Investigated by Transient TCAD Simulation Hiroyuki Ota, Shinji Mgita, Tsutomu Ikegami, Junichi Hattori, Hidehiro Asai, Koichi Fukuda (AIST), Akira Toriumi (The Univ. of Tokyo) SDM2017-91 |
[more] |
SDM2017-91 pp.1-4 |
SDM |
2017-02-06 13:35 |
Tokyo |
Tokyo Univ. |
[Invited Talk]
Electrical coupling of stacked transistors in monolithic three-dimensional inverters and its dependence on the interlayer dielectric thickness Junichi Hattori, Koichi Fukuda, Toshifumi Irisawa, Hiroyuki Ota, Tatsuro Maeda (AIST) SDM2016-143 |
We study the electrical coupling of stacked transistors in monolithic three-dimensional (3D) inverters and investigate i... [more] |
SDM2016-143 pp.23-28 |
SDM |
2017-01-30 10:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Demonstrating Performance Improvement of Complementary TFET Circuits by ION Enhancement Based on Isoelectronic Trap Technology Takahiro Mori, Hidehiro Asai, Junichi Hattori, Koichi Fukuda, Shintaro Otsuka, Yukinori Morita, Shin-ichi O'uchi, Hiroshi Fuketa, Shinji Migita, Wataru Mizubayashi, Hiroyuki Ota, Takashi Matuskawa (ANational Institute of Advanced Industrial ScieIST) SDM2016-130 |
We improved the performance of a complementary circuit comprising Si-based tunnel field-effect transistors (TFETs) by us... [more] |
SDM2016-130 pp.1-4 |
SDM |
2017-01-30 11:30 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Fully Coupled 3-D Device Simulation of Negative Capacitance FinFETs for Sub 10 nm Integration Hiroyuki Ota, Tsutomu Ikegami, Junichi Hattori, Koichi Fukuda, Shinji Migita (AIST), Akira Toriumi (The Univ. of Tokyo) SDM2016-133 |
Subthreshold operation of negative capacitance FinFETs (NC-FinFETs) at sub 10 nm gate length are analyzed with a newly d... [more] |
SDM2016-133 pp.13-16 |
SDM |
2016-06-29 10:40 |
Tokyo |
Campus Innovation Center Tokyo |
[Invited Lecture]
Design of SOI-FETs for Steep Slope Switching using Negative Capacitance in Ferroelectric Gate Insulators Hiroyuki Ota, Shinji Migita, Junichi Hattori, Koichi Fukuda (AIST), Akira Toriumi (The Univ. of Tokyo) SDM2016-34 |
This paper discusses a design of fully depleted silicon-on-insulator field-effect transistors with ferroelectric gate in... [more] |
SDM2016-34 pp.9-13 |
SDM |
2016-01-28 11:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Understanding of BTI for Tunnel FETs Wataru Mizubayashi, Takahiro Mori, Koichi Fukuda, Yuki Ishikawa, Yukinori Morita, Shinji Migita, Hiroyuki Ota, Yongxun Liu, Shinichi O'uchi, Junichi Tsukada, Hiromi Yamauchi, Takashi Matsukawa, Meishoku Masahara, Kazuhiko Endo (AIST) SDM2015-122 |
(To be available after the conference date) [more] |
SDM2015-122 pp.9-12 |
SDM, ICD |
2015-08-24 15:00 |
Kumamoto |
Kumamoto City |
[Invited Talk]
Recent progress and challenges of high-mobility III-V/Ge CMOS technologies for low power LSI applications Toshifumi Irisawa (AIST), Keiji Ikeda, Yuuichi Kamimuta, Minoru Oda, Tsutomu Tezuka (AIST/Toshiba), Tatsurou Maeda, Hiroyuki Ota, Kazuhiko Endo (AIST) SDM2015-63 ICD2015-32 |
[more] |
SDM2015-63 ICD2015-32 pp.31-36 |
SDM |
2015-01-27 15:30 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Accurate Prediction of PBTI Lifetime in N-type Fin-Channel High-k Tunnel FETs Wataru Mizubayashi, Takahiro Mori, Koichi Fukuda, Yongxun Liu, Takashi Matsukawa, Yuki Ishikawa, Kazuhiko Endo, Shinichi Ohuchi, Junichi Tsukada, Hiromi Yamauchi, Yukinori Morita, Shinji Migita, Hiroyuki Ota, Meishoku Masahara (AIST) SDM2014-143 |
The positive bias temperature instability (PBTI) characteristics for n-type fin-channel tunnel FETs (TFETs) with high-k ... [more] |
SDM2014-143 pp.33-36 |
SDM |
2015-01-27 16:20 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Scaling Breakthrough for Analog/Digital Circuits by Suppressing Variability and Low-Frequency Noise for FinFETs by Amorphous Metal Gate Technology Takashi Matsukawa, Koichi Fukuda, Yongxun Liu, Junichi Tsukada, Hiromi Yamauchi, Yuki Ishikawa, Kazuhiko Endo, Shinichi O'uchi, Shinji Migita, Wataru Mizubayashi, Yukinori Morita, Hiroyuki Ota, Meishoku Masahara (AIST) SDM2014-145 |
[more] |
SDM2014-145 pp.41-44 |
SDM |
2015-01-27 16:45 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Experimental Realization of Complementary p- and n- Tunnel FinFETs with Subthreshold Slopes of Less than 60 mV/decade and Very Low (pA/um) Off-Current on a Si CMOS Platform Yukinori Morita, Takahiro Mori, Koichi Fukuda, Wataru Mizubayashi, Shinji Migita, Takashi Matsukawa, Kazuhiko Endo, Shinichi O'uchi, Yongxun Liu, Meishoku Masahara, Hiroyuki Ota (AIST) SDM2014-146 |
Complementary (p- and n-type) tunnel FinFETs operating with subthreshold slopes (SSs) of less than 60 mV/decade and very... [more] |
SDM2014-146 pp.45-48 |
ICD, SDM |
2014-08-04 13:05 |
Hokkaido |
Hokkaido Univ., Multimedia Education Bldg. |
[Invited Talk]
Research progress in steep slope devices and technologies to enhance ON current in TFETs Takahiro Mori, Yukinori Morita, Shinji Migita, Wataru Mizubayashi, Koichi Fukuda, Noriyuki Miyata, Tetsuji Yasuda, Meishoku Masahara, Hiroyuki Ota (AIST) SDM2014-67 ICD2014-36 |
Steep slope devices (SSDs) have attracted because of the increase demand for low-power devices. This paper reviews recen... [more] |
SDM2014-67 ICD2014-36 pp.29-34 |
ICD |
2014-04-18 13:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Multigate FinFET Device and Circuit Technology for 10nm and Beyond Meishoku Masahara, Kazuhiko Endo, Shin-ichi Ouchi, Takashi Matsukawa, Yongxun Liu, Shinji Migita, Wataru Mizubayashi, Yukinori Morita, Hiroyuki Ota (AIST) ICD2014-15 |
One of the biggest challenges for the VLSI circuits with 20-nm-technology nodes and beyond is to overcome the issue of a... [more] |
ICD2014-15 pp.77-82 |
SDM |
2014-01-29 10:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Heated Ion Implantation Technology for Highly Reliable Metal-gate/High-k CMOS SOI FinFETs Wataru Mizubayashi (AIST), Hiroshi Onoda, Yoshiki Nakashima (Nissin Ion Equipment), Yuki Ishikawa, Takashi Matsukawa, Kazuhiko Endo, Yongxun Liu, Shinichi Ouchi, Junichi Tsukada, Hiromi Yamauchi, Shinji Migita, Yukinori Morita, Hiroyuki Ota, Meishoku Masahara (AIST) SDM2013-138 |
The impact of heated ion implantation (I/I) technology on metal-gate (MG)/high-k (HK) CMOS SOI FinFET performance and re... [more] |
SDM2013-138 pp.13-16 |
SDM, ICD |
2013-08-01 09:25 |
Ishikawa |
Kanazawa University |
Performance Enhancement of Tunnel Field-Effect Transistors by Synthetic Electric Field Effect Yukinori Morita, Takahiro Mori, Shinji Migita, Wataru Mizubayashi, Akihito Tanabe, Koichi Fukuda, Kazuhiko Endo, Takashi Matsukawa, Shin-ichi O'uchi, Yongxun Liu, Meishoku Masahara, Hiroyuki Ota (AIST) SDM2013-66 ICD2013-48 |
A synthetic electric field effect to enhance the performance of tunnel field-effect transistors (TFETs) is proposed. The... [more] |
SDM2013-66 ICD2013-48 pp.7-12 |