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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2011-10-26
13:50		 Fukui Fukui Univ. Properties of AZO Thin Films Deposited at Room Temperature by the RF-DC Coupled Magnetron Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Yusuke Tomiguchi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) CPM2011-111		 In order to examine that influence of low voltage sputtering method on properties of AZO thin films, deposition of AZO t... [more] CPM2011-111
pp.11-15
EMD, CPM, OME 2011-06-30
16:55		 Tokyo   Properties of AZO Thin Films Deposited at Room temperature by Low Voltage Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) EMD2011-18 CPM2011-54 OME2011-32		 In order to examine that effect of high energy particles and fabricated conditions of targets, such as sintering tempera... [more] EMD2011-18 CPM2011-54 OME2011-32
pp.59-63
CPM 2010-07-29
14:20		 Hokkaido Michino-Eki Shari Meeting Room Characteristic of AZO thin films deposited at room temperature by sputtering method
Hidehiko Shimizu, Jun Kashiide, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-32		  [more] CPM2010-32
pp.5-9
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